Entegris, Inc.

Advanced Technology Materials, Inc.

Lin Feng

Joseph D Sweeney

W Karl Olander

Brian L Benac

Oleg Byl

Peng Zhang

Robert E Kaim

Ying Tang

Sharad N Yedave

Karl E Boggs

Melissa A Petruska

Jeffrey A Barnes

Jun Liu

Steven E Bishop

David James Eldridge

Xiaodong Yan

Karl W Olander

Steven Sergi

Cleaning of an ion implantation system or components thereof, utilizing temperature and/or a reactive cleaning reagent enabling growth/etching of the cathode in an indirectly heated cathode for an ion implantation system by monitoring the cathode bias power and taking corrective action depending upon compared values to etch or regrow the cathode.

Ion source cleaning in semiconductor processing systems

A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions include novel corrosion inhibitors. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

Copper cleaning and protection formulations

Growing community of inventors

Orange, CT, United States of America

Lin Feng