Kotura, Inc.

Kotusa, Inc.

Lih-Jou Chung

Wei Qian

Joan Fong

Dawei Zheng

Xiaoming Yin

Zhian Shao

Dazeng Feng

A method of fabricating an optical component includes forming a mask on an optical component precursor. The method also includes etching through at least a portion of the mask so as to etch an underlying medium concurrently with remaining mask and transfer a feature of an upper surface of the mask onto an upper surface of the underlying medium. The etch can be configured such that a ratio of the underlying medium etch rate to the mask etch rate is less than about 1.5:1. In some instances, the underlying medium is silicon and the mask is a photoresist.

Controlled selectivity etch for use with optical component fabrication

A method of forming an optical component includes forming a first mask on an optical component precursor. The first mask is formed with a plurality of waveguide portions extending from a common portion. Each waveguide portion is positioned so as to protect a waveguide region of the optical component precursor where a waveguide is to be formed. The method also includes forming a second mask between waveguide portions of the first mask. The resistance of the second mask to etching varies along at least one dimension of the second mask.

Optical component having waveguides extending from a common region

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Anaheim, CA, United States of America

Lih-Jou Chung