Sandisk Technologies Inc.

Liang Pang

Yingda Dong

Jayavel Pachamuthu

Ching-Huang Lu

Jiahui Yuan

Ashish Kumar Baraskar

Charles S Kwong

Xuehong Yu

Eran Sharon

Idan Alrod

Yanli Zhang

Evgeny Mekhanik

Alon Eyal

Hong-Yan Chen

Zhengyi Zhang

Jingjian Ren

Tien-Chien Kuo

Vinh Diep

Raghuveer S Makala

Jian Feng Chen

Nian Niles Yang

Pao-Ling Koh

Nan Lu

Matthias Baenninger

Caifu Zeng

Charles Kwong

Jian Chen

A three-dimensional non-volatile memory is provided with reduced programming variation across word lines. The gate lengths of word lines decrease from the top to the bottom of the memory hole. Increased programming speeds due to a narrow memory hole are offset by a smaller gate length at corresponding positions. A blocking dielectric thickness may also be varied, independently or in combination with a variable word line thickness. The blocking dielectric is formed with a horizontal thickness that is larger at regions adjacent to the lower word line layers and smaller at regions adjacent to the upper word line layers. The larger thickness at the lower word line layers reduces the programming speed in the memory hole for the lower word lines relative to the upper word lines. A variance in programming speed resulting from differences in memory hole diameter may be offset by a corresponding variance in blocking dielectric thickness.

Non-volatile memory with reduced program speed variation

Techniques are provided for improving the accuracy of read operations of memory cells, where the threshold voltage of a memory cell can shift depending on when the read operation occurs. A memory cell is sensed by discharging a sense node into a bit line and detecting an amount of discharge at two sense times relative to a trip voltage. A bit of data is stored in first and second latches based on the two sense times, to provide first and second pages of data. The pages are evaluated using parity check equations and one of the pages which satisfies the most equations is selected. In another option, word line voltages are grounded and then floated to prevent coupling up of the word line. A weak pulldown to ground can gradually discharge a coupled up voltage of the word lines.

First read solution for memory

Techniques are provided for improving the accuracy of read operations of memory cells, where the threshold voltage of a memory cell can shift depending on when the read operation occurs. A command is issued for performing a conditioning operation which helps to transition the memory cells so that their threshold voltages are at predictable levels. In one approach, the conditioning operation is performed by applying a voltage pulse to one or more word lines in response to a trigger, such as detecting that a duration since a last sensing operation exceeds a threshold, detecting that a duration since a last performance of the conditioning operation exceeds a threshold, or a detecting that a read command has been issued. Moreover, the peak power consumption required to perform the conditioning operation can be reduced for various configurations of a memory device on one or more die.

Command sequence for first read solution for memory

Techniques are provided for improving the accuracy of read operations of memory cells, where the threshold voltage (Vth) of a memory cell can shift depending on when the read operation occurs. Countermeasures are provided for a first read situation in which a memory is read after a power on event or after a long delay since a last read. Read voltages of lower or higher programmed data states are set according to a positive or negative temperature coefficient (Tco), respectively. Read voltages for error recovery can be set similarly. In another aspect, a wait period between a dummy voltage and a read voltage is a function of temperature. In another aspect, word line voltages of unselected blocks are set according to a negative Tco. In another aspect, pass voltages are set based on a Tco for each programmed data state.

Dynamic tuning of first read countermeasures

Disclosed herein is a 3D memory with a select transistor, and method for fabricating the same. The select transistor may have a conductive floating gate, a conductive control gate, a first dielectric between the conductive floating gate and the conductive control gate, and a second dielectric between a body and the conductive floating gate. In one aspect, a uniform gate dielectric is formed using lateral epitaxial growth in a recess adjacent a crystalline semiconductor select transistor body, followed by forming the gate dielectric from the epitaxial growth. Techniques help to prevent, or at least reduce, a leakage current between the select transistor control gate and the select transistor body and/or the semiconductor substrate below the select transistor. Therefore, select transistors having a substantially uniform threshold voltage, on current, and S-factor are achieved. Also, select transistors have a high on-current and a steep sub-threshold slope.

Select transistors with tight threshold voltage in 3D memory

A memory device and associated techniques to reduce charge loss of memory cells. In one aspect, a charge loss countermeasure is performed if a word line selected for programming is adjacent to a dummy word line. The countermeasure can involve programming the dummy memory cells through injection disturb. In one approach, the timing is adjusted for the voltages on the selected word line and the dummy word line at the end of a program voltage. The selected word line voltage can be decreased more quickly, or the dummy word line voltage can be decreased more slowly. The decrease of the dummy word line voltage can also be delayed. Another approach involves elevating the bit line voltage during the decrease of the selected word line voltage. The bit line voltage can be a function of the assigned data state of a selected cell.

Reducing charge loss in data memory cell adjacent to dummy memory cell

A memory device and associated techniques adjust voltage ramping times optimally for each block or sub-block of memory cells to account for fabrication variations. The widths of word lines and select gate lines can vary in different sub-blocks due to misalignments in the fabrication process. The resistance and voltage settling times vary based on the widths. In one aspect, a shortest acceptable ramp down period is determined for a select gate line. This period avoids excessive read errors. A corresponding shortest acceptable word line voltage ramping period is then determined for each sub-block. A pattern in the ramp down periods can be detected among the tested sub-blocks or blocks and used to set ramp down periods in other sub-blocks or blocks. The overall time for a programming or read operation is therefore minimized.

Detecting misalignment in memory array and adjusting read and verify timing parameters on sub-block and block levels

Disclosed herein are methods of forming non-volatile storage. An opening may be etched through a stack of two alternating materials to a semiconductor substrate. A silicon nitride film may be formed on a vertical sidewall of the opening. The semiconductor substrate may be cleaned to remove oxide from the semiconductor substrate. The silicon nitride film protects the materials in the stack while cleaning the semiconductor substrate. The silicon nitride film may be converted to an oxide after cleaning the semiconductor substrate. A semiconductor region may be formed in contact with the cleaned semiconductor substrate. A memory cell film may be formed over the oxide in the opening. Control gates may be formed by replacing one of the materials in the stack with a conductive material. The oxide may serve as a blocking layer between the control gates and charge storage regions in the memory cell film.

Forming memory cell film in stack opening

Techniques are provided for measuring the endurance of a set of data memory cells by evaluating the threshold voltage (Vth) of associated dummy memory cells. A cell has a high endurance or good data retention if it is able to maintain the charges. However, there can be a variation in the endurance of cells even within a single die. By evaluating the dummy memory cells, an early warning can be obtained of a degradation of the data memory cells. Moreover, there is no interference with the operation of the data memory cells. Based on a number of dummy memory cells which have a Vth below a demarcation voltage, a corrective action is taken such as adjusting read voltages, an initial program voltage and/or an initial erase voltage, or marking the block as being bad and recovering the data.

Block health monitoring using threshold voltage of dummy memory cells

A memory device and associated techniques avoid a disturb of a select gate transistor during an erase operation for memory cells in a string. During the erase operation, a channel of the string is charged up from a source end of the string. However, there is a delay in charging up a drain end of the channel. A voltage detector connected to a bit line detects when a drain end of the channel reaches a reference voltage. When the reference voltage is reached, a voltage of the select gate transistor at the drain end of the string can be floated. This avoids unintentional programming of the select gate transistor which could otherwise occur if the voltage was floated to soon. Also, a substrate voltage may be ramped up to a first detected level before being ramped up to a second, final level.

Suppressing disturb of select gate transistors during erase in memory

Techniques are provided for improving the accuracy of read operations of memory cells, where the threshold voltage (Vth) of a memory cell can shift depending on when the read operation occurs. In one aspect, a dummy voltage is applied to the word lines to cause a coupling up of the word lines and weak programming. This can occur when a specified amount of time has elapsed since a last program or read operation, or when a power on event is detected for the memory device. A number of read errors can also be considered. The dummy voltage is similar to a pass voltage of a program or read operation but no sensing is performed. The word line voltages are therefore provided at a consistently up-coupled level so that read operations are consistent. The coupling up occurs due to capacitive coupling between the word line and the channel.

Dummy voltage to reduce first read effect in memory

Techniques for fabricating a memory device which has reduced neighboring word line interference, and a corresponding memory device. The memory device comprises a stack of alternating conductive and dielectric layers, where the conductive layers form word lines or control gates of memory cells. In one aspect, rounding off of the control gate layers due to inadvertent oxidation during fabrication is avoided. An amorphous silicon layer is deposited along the sidewall of the memory holes, adjacent to the control gate layers. SiNis deposited along the amorphous silicon layer and oxidized in the memory hole to form SiO. The amorphous silicon layer acts as an oxidation barrier for the sacrificial material of the control gate layers. The amorphous silicon layer is subsequently oxidized to also form SiO. The two SiOlayers together form a blocking oxide layer.

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Fremont, CA, United States of America

Liang Pang