United Microelectronics Corp.

Liang Ju Wei

Chun-Lung Chen

Chung-Yi Chiu

Hsuan-Hsu Chen

Zhen Wu

A control method of a multi-stage etching process and a processing device using the same are provided. The control method of the multi-stage etching process includes the following step S. A stack information of a plurality of hard mask layers is set. An etching target condition is set. Through a machine learning model, a parameter setting recipe of the hard mask layers is generated under the etching target condition. The machine learning model is trained based on the stack information of the hard mask layers, a plurality of process parameters and a process result.

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Chiayi, Taiwan

Liang Ju Wei