Hefechip Corporation Limited

United Integrated Circuits Corp.

United Microelectronics Corp.

Liang-Choo Hsia

Geeng-Chuan Chern

H J Wu

A semiconductor memory device includes a substrate; a film stack on the substrate; a silicon device layer on the film stack; and a trench with corrugated sidewall surface extending into the silicon device layer, the film stack, and the substrate. A trench capacitor is located in the trench. The trench capacitor includes an inner electrode and an outer electrode with a node dielectric layer therebetween. The node dielectric layer is in direct with the film stack and the bulk semiconductor substrate. A transistor is disposed on the substrate. The transistor includes a source region and a drain region, a channel region between the source region and the drain region, and a gate over the channel region. The source region is electrically connected to the inner electrode of the trench capacitor.

Trench capacitor having improved capacitance and fabrication method thereof

A method for forming a semiconductor device is disclosed. A substrate having a semiconductor substrate, an insulator layer on the semiconductor substrate, and a silicon device layer on the insulator layer is provided. At least one capacitor cavity with corrugated sidewall surface is formed within the insulator layer between the semiconductor substrate and the silicon device layer. At least one buried capacitor is formed in the at least one capacitor cavity. The at least one buried capacitor comprises inner and outer electrodes with a capacitor dielectric layer therebetween. At least one transistor is formed on the substrate. The at least one transistor comprises a source region, a drain region, a channel region between the source region and the drain region, and a gate over the channel region. The source region is electrically connected to the inner electrode of the at least one buried capacitor.

Method for fabricating semiconductor memory device with buried capacitor and fin-like electrodes

A stacked capacitor includes a substrate having a first ILD layer thereon and a source conductive plate in the first ILD layer; a second ILD layer disposed on the first ILD layer; and a stacked capacitor area in the second ILD layer. The stacked capacitor area partially exposes the source conductive plate. A fin-shaped structure is disposed on the source conductive plate within the stacked capacitor area. The fin-shaped structure includes horizontal fins and vertical fins. A widened central hole penetrates through the fin-shaped structure and partially exposes the source conductive plate. A first conductive layer is disposed on the fin-shaped structure and the source conductive plate in the widened central hole. A capacitor dielectric layer is disposed on the first conductive layer. A second conductive layer is disposed on the capacitor dielectric layer.

Stacked capacitor with horizontal and vertical fin structures and method for making the same

A semiconductor device includes a substrate having a semiconductor substrate, an insulator layer on the semiconductor substrate, and a silicon device layer on the insulator layer. At least one capacitor cavity with corrugated sidewall surface is disposed within the insulator layer between the semiconductor substrate and the silicon device layer. At least one buried capacitor is provided in the at least one capacitor cavity. The at least one buried capacitor includes an inner electrode and an outer electrode with a capacitor dielectric layer therebetween.

Semiconductor memory device with buried capacitor and fin-like electrodes

A semiconductor device includes a substrate having at least one trench with corrugated sidewall surface. At least one trench capacitor is located in the at least one trench. The at least one trench capacitor includes inner and outer electrodes with a node dielectric layer therebetween. At least one transistor is provided on the substrate. The at least one transistor comprises a source region and a drain region, a channel region between the source region and the drain region, and a gate over the channel region. The source region is electrically connected to the inner electrode of the at least one trench capacitor.

A semiconductor device includes a bottle-shaped capacitor cavity extends through a silicon device layer and a buried oxide layer of a substrate. The bottle-shaped capacitor cavity includes an upper portion in the silicon device layer and a widened bottom burrow in the buried oxide layer and underneath the silicon device layer. The widened bottom burrow is wider than the upper portion. A buried capacitor is disposed in the bottle-shaped capacitor cavity. The buried capacitor includes an inner electrode and an outer electrode with the capacitor dielectric layer therebetween. A transistor is disposed on the substrate. The transistor includes a source region and a drain region, a channel region between the source region and the drain region, and a gate over the channel region. The source region is electrically connected to the inner electrode.

Semiconductor memory device with shallow buried capacitor and fabrication method thereof

A floating body ESD protection circuit positioned between and coupled to an I/O pad and an internal circuit. A p-type depletion mode transistor is used to control the body of an n-type enhancement mode transistor. When the p-type depletion mode transistor is triggered, the body of n-type enhancement mode transistor remains grounded. If the p-type depletion mode transistor has not been triggered, the body remains in a floating state, lowering the range of the snapback voltage. As a consequence the ESD protection circuit is able to function more rapidly. Similarly, an n-type depletion mode transistor is used to control the body of a p-type enhancement mode transistor. When the n-type depletion mode transistor is triggered, the body remains coupled to a high voltage. If the n-type depletion mode transistor has not been triggered, the body is in a floating state. Thus, the range of the snapback voltage can be lowered, enabling the ESD protection circuit to function more rapidly.

Floating body ESD protection circuit

A method of fabricating an improved spacer comprising the steps of providing a semiconductor substrate that has a gate already formed thereon. A PNO spacer is formed on a sidewall of the gate. The method of forming the PNO spacer comprises first forming a PNO layer on the conductive layer and the semiconductor, and performing an anisotropic etching step on the PNO layer to form the PNO spacer. The step of forming the PNO layer includes chemical vapor deposition (CVD) using PH,, O,, NH,and N,as reagents. The step of etching the PNO layer includes plasma etching using CF,&plus;O,as plasma source. The material of the PNO spacer is a chemical compound P,N,O,containing phosphorous (P), nitrogen (N) and oxygen (O) and does not contain silicon. Therefore, the PNO spacer can avoid erosion during etching and does not react with Ti during the Salicide process.

Method of fabricating an improved spacer

A voltage boosting circuit having an asymmetric MOS in DRAM. A gate of a first NMOS connects to a voltage source, and a source region of the first NMOS connects to a row decoder. A gate of the asymmetric NMOS connects to a drain region of the first NMOS. A drain region of the asymmetric NMOS connects to a column decoder, and a source region of the first asymmetric NMOS connects to a word line. A gate of a second NMOS connects to the column decoder, a source region of the second NMOS connects to a ground terminal and a drain region of the second NMOS connects to a source region of the first asymmetric NMOS.

Voltage boosting circuit having asymmetric MOS in DRAM

A method of fabricating an embedded dynamic random access memory. Using the method of dual damascence, by forming patterning only one dielectric layer, the contact windows with different depth are formed. In addition, the metal layer formed within the metal connecting regions are used as interconnects without further process.

Method of fabricating embedded dynamic random access memory

A circuit structure which avoids a latchup effect. An N-well is formed in a P-type substrate. An N-type contact is formed in the N-well. A PMOS is located on the N-well. A gate of the PMOS connects to an input terminal and a source region of the PMOS connects to a voltage source. A first NMOS and a second NMOS are located on the P-type substrate. A gate of the first NMOS connects to the input terminal, a source region of the first NMOS connects to a ground terminal, and a drain region of the first NMOS connects to an output terminal and a drain region of the PMOS. A gate of the second NMOS connects to the output terminal, a source region of the second NMOS connects to a voltage source, and a drain region of the second NMOS connects to the N-type contact.

Growing community of inventors

Hsinchu, Taiwan

Liang-Choo Hsia