National Taiwan University

Instrument Technology Research Center, National Applied Research Laboratories

Liang-chiun Chao

Jyh-Shin Chen

Chung-chi Liau

Sheng-Yuan Chen

Jun-wei Lee

Hsiao-Yu Chou

Methods to manufacture metal nanopins and metal oxide nanopins are disclosed. Metal nanopins are fabricated on a metal foil by capillaritron plasma source dry etching. The aspect ratio and the density of metal nanopins are controlled by adjusting the temperature of the metal foil during ion beam dry etching. The end radius of metal nanopins less than 10 nm and the aspect ratio of metal nanopins between 25 and 30 can be achieved. Besides, metal oxide nanopins are fabricated by ion implantation and thermal oxidation. The metal foil is implanted with ions and then thermally oxidized to form the metal oxide nanopins. It shows that the metal oxide nanopins fabricated with oxygen implantation exhibit better field emission properties.

Nanopin manufacturing method and nanometer sized tip array by utilizing the method

The present invention provides a method and an apparatus for producing a two-dimensional patterned beam, e.g. a two-dimensional patterned and focused ion beam, for fabricating a nano-structure on a substrate with the precursor gas. In comparison with the conventional focused ion beam that is applied for fabricating a dot-like nano-structure the method is more simplified and easy to be achieved.

Method and device for fabricating nano-structure with patterned particle beam

Growing community of inventors

Taipei, Taiwan

Liang-chiun Chao