Commonwealth Scientific and Industrial Research Organisation

University of Dayton

Li-ming Dai

Albert Mau

Shaoming Huang

Yong Yang

Hui Zhu He

This invention relates to a process for preparing a substrate-supported aligned carbon nanotube film including: synthesizing a layer of aligned carbon nanotubes on the substrate capable of supporting nanotube growth, applying a layer of a second substrate to a top surface of aligned carbon nanotube layer, removing said substrate capable of supporting nanotube growth to provide an aligned carbon nanotube film supported on said second substrate.

Substrate-supported aligned carbon nanotube films

A process for preparing a patterned layer of aligned carbon nanotubes on a substrate including: applying a pattern of polymeric material to the surface of a substrate capable of supporting nanotube growth using a soft-lithographic technique; subjecting said polymeric material to carbonization to form a patterned layer of carbonized polymer on the surface of the substrate; synthesising a layer of aligned carbon nanotubes on regions of said substrate to which carbonized polymer is not attached to provide a patterned layer of aligned carbon nanotubes on said substrate.

Process for making aligned carbon nanotubes

This invention relates to a process for preparing a patterned layer of aligned carbon nanotubes on a substrate including: applying a photoresist layer to at least a portion of a surface of a substrate capable of supporting nanotube growth, masking a region of said photoresist layer to provide a masked portion and an unmasked portion, subjecting said unmasked portion to electromagnetic radiation of a wavelength and intensity sufficient to transform the unmasked portion while leaving the masked portion substantially untransformed, said transformed portion exhibiting solubility characteristics different to said untransformed portion, developing said photoresist layer by contacting with a solvent for a time and under conditions sufficient to dissolve one of said transformed and untransformed portions of the photoresist, leaving the other portion attached to said substrate, synthesising a layer of aligned carbon nanotubes on regions of said substrate to which said remaining photoresist portion is not attached to provide a patterned layer of aligned carbon nanotubes on said substrate.

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Wheelers Hill, Australia

Li-ming Dai