Delta Electronics, Inc.

Ancora Semiconductors Inc.

Delta Electroncis, Inc.

Delta Electroncs, Inc.

Li-Fan Lin

Wen-Chia Liao

Chun-Chieh Yang

Shih-Peng Chen

Ching-Chuan Shiue

Ying-Chen Liu

Hsuan-Wen Chen

Chang-Jing Yang

Po-Chin Peng

A semiconductor device includes an active layer having first and second active regions, first and second source electrodes, first and second drain electrodes, first and second gate electrodes, a first source metal layer, first and second drain metal layers, and a source pad electrically connected to the first source metal layer. The second drain metal layer is electrically connected to the second drain electrode and the first source metal layer. A projection of the second drain metal layer on the active layer forms a drain metal layer region. An projection of the source pad on the active layer forms a source pad region. An area of an overlapping region between the source pad region and the drain metal layer region is smaller than or equal to 40% of an area of the drain metal layer region.

Semiconductor device including source pad region and drain pad region configured to improve current uniformity and reduce resistance

A semiconductor device includes an active layer having an active region, a source electrode, a drain electrode, a gate electrode, a source metal layer, a drain metal layer, and a source pad. The source metal layer and the drain metal layer are electrically connected to the source electrode and the drain electrode, respectively. An orthogonal projection of the drain metal layer on the active layer each forms a drain metal layer region. The source pad is electrically connected to the source metal layer. An orthogonal projection of the source pad on the active layer forms a source pad region overlapping the drain metal layer. An area of an overlapping region between the source pad region and the drain metal layer region is smaller than or equal to 40% of an area of the drain metal layer region.

Semiconductor device having reduced capacitance between source and drain pads

A semiconductor device includes an active layer, a source electrode, a drain electrode, a gate electrode, a first insulating layer, a first source pad, and a first drain pad. The source electrode, the drain electrode, and the gate electrode are disposed on an active region of the active layer. The first insulating layer is disposed on the source electrode, the drain electrode, and the gate electrode. The first source pad and the first drain pad are disposed on the first insulating layer and the active region. The first source pad includes a first source body and a first source branch. The first source branch is electrically connected to the first source body and disposed on the source electrode. The first drain pad includes a first drain body and a first drain branch. The first drain branch is electrically connected to the first drain body and disposed on the drain electrode.

Heterojunction semiconductor device for reducing parasitic capacitance

A semiconductor device includes a substrate, a power device, a protection circuit, a dielectric layer, a drain pad, a source pad, and a gate pad. The power device and the protection circuit are disposed on the substrate. The power device includes a drain electrode, a source electrode, and a gate electrode. The protection circuit has a first terminal electrically connected with the source pad and a second terminal electrically connected with the gate pad. The dielectric layer is disposed on the power device and the protection circuit. The drain pad, the source pad, and the gate pad are disposed on the dielectric layer and respectively electrically connected with the drain electrode, the source electrode, and the gate electrode. At least part of the protection circuit is disposed under the source pad, the gate pad, or the drain pad.

Power semiconductor device integrated with ESD protection circuit under source pad, drain pad, and/or gate pad

A semiconductor device including an active layer made of III-V group semiconductors, a source electrode and a drain electrode disposed on the active layer, a gate electrode disposed on or above the active layer and between the source electrode and the drain electrode, an interlayer dielectric covering the source electrode, the drain electrode, and the gate electrode and having a plurality of inter-gate via holes. The semiconductor device further includes an inter-source layer, an inter-drain layer, and an inter-gate layer disposed on the interlayer dielectric. The semiconductor device further includes an inter-gate plug filled in the inter-gate via hole and electrically connected to the gate electrode and the inter-gate layer, and a gate field plate being separated from the gate electrode and electrically connected to the gate electrode through the inter-gate layer.

A semiconductor device includes an active layer, a source electrode, a drain electrode, a gate electrode, a first insulating layer, a gate metal layer, a via, a first source metal layer, a drain metal layer, and a second source metal layer. The source electrode, the drain electrode, and the gate electrode are present on the active layer. The first insulating layer is present on the source electrode, the drain electrode, and the gate electrode. The gate metal layer, the first source metal layer, the second source metal layer, and the drain metal layer are present on the first insulating layer. The gate metal layer includes a narrow portion and a wider portion. The via is present between the metal gate layer and the gate electrode. The second source metal layer is present between the gate metal layer and the drain metal layer.

Transistor with a gate metal layer having varying width

A semiconductor device includes an active layer, a source electrode, a drain electrode, a gate electrode, a first insulating layer, a first source pad, and a first drain pad. The source electrode, the drain electrode, and the gate electrode are disposed, on an active region of the active layer. The first insulating layer is disposed on the source electrode, the drain electrode, and the gate electrode. The first source pad and the first drain pad are disposed on the first insulating layer and the active region. The first source pad includes a first source body and a first source branch. The first source branch is electrically connected to the first source body and disposed on the source electrode. The first drain pad includes a first drain body and a first drain branch. The first drain branch is electrically connected to the first drain body and disposed on the drain electrode.

A semiconductor device includes an active layer, a source electrode, a drain electrode, a gate electrode, an interlayer dielectric, an inter-source layer, an inter-source plug, an inter-drain layer, an inter-drain plug, an inter-gate layer, and an inter-gate plug. The active layer is made of III-V group semiconductors. The source electrode, the drain electrode, and the gate electrode are disposed on the active layer. The gate electrode is disposed between the source electrode and the drain electrode. The interlayer dielectric covers the source electrode, the drain electrode, and the gate electrode. The inter-source layer, the inter-drain layer, and the inter-gate layer are disposed on the interlayer dielectric. The inter-source plug is electrically connected to the source electrode and the inter-source layer. The inter-drain plug is electrically connected to the drain electrode and the inter-drain layer. The inter-gate plug is electrically connected to the gate electrode and the inter-gate layer.

A semiconductor device includes an element layer, plural source electrodes, plural drain electrodes, plural gate electrodes, a source bus bar, a drain bus bar, a first gate bus bar, and a second gate bus bar. The source electrodes, the drain electrodes, and the gate electrodes are disposed on the element layer and extend along a first direction. The gate electrodes are respectively disposed between the source and drain electrodes. The source and drain bus bars and the first and second gate bus bars extend along a second direction interlaced with the first direction. The source bus bar and the drain bus bar are electrically connected to the source electrodes and the drain electrodes, respectively. The first and second gate bus bars are connected to the gate electrodes. The first bus bar is disposed at one end of the source electrodes. The source electrode crosses the second gate bus bar.

Semiconductor device

A switching circuit includes a normally-on switch, a normally-off switch, a current compensating unit and a current sharing unit. Each of the normally-on switch and the normally-off switch include a first terminal, a second terminal and a control terminal respectively. The first terminal of the normally-off switch is connected to the second terminal of the normally-on switch. The second terminal of the normally-off switch is connected to the control terminal of the normally-on switch. The current compensating unit is connected to the normally-on switch and configured to generate a compensating current when a leakage current of the normally-on switch is smaller than the leakage current of the normally-off switch. The current sharing unit is connected to the normally-off switch and configured to share the leakage current of the normally-on switch when the leakage current of the normally-on switch is larger than the leakage current of the normally-off switch.

Switching circuit and current compensating method therein

A power semiconductor device and a method for fabricating the same are provided. The power semiconductor device includes a substrate and an active layer on the substrate. A gate electrode is disposed on the active layer. A first electrode and a second electrode are disposed on the active layer, on opposite sides of the gate electrode. A first metal pattern is coupled to the first electrode. A second metal pattern is coupled to the second electrode. A first insulating layer is disposed on the first and second metal patterns. A third metal pattern covers the first insulating layer, coupled to the second metal pattern. An interface between the third metal pattern and the first insulating layer is a substantially planar surface.

Power semiconductor device and method for fabricating the same

A semiconductor device includes an active layer, source electrodes, drain electrodes, gate electrodes, a first dielectric layer, source trace, first source vias, a second dielectric layer, a source pad, and second source vias. The first dielectric layer covers the source electrodes, the drain electrodes, and the gate electrodes. The source traces are disposed on the first dielectric layer, are electrically connected to the source electrodes, and are covered by the second dielectric layer. The source pad is disposed on the second dielectric layer, and includes a first source trunk, a first source branch, and a source sub-branch. The first source branch is protruded from the first source trunk and is electrically connected to one of the drain traces through the second source vias. The source sub-branch is protruded from the first source branch and is electrically connected one of the source electrodes through the third source vias.

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Taoyuan, Taiwan

Li-Fan Lin