Carl Zeiss Microscopy Gmbh

Carl Zeiss Nts Gmbh

Lewis A Stern

John Anthony Notte, Iv

Lawrence Scipioni

Billy W Ward

Rainer K Knippelmeyer

Louis S Farkas, Iii

William DiNatale

Nicholas Economou

Mohan Ananth

Bill DiNatale

Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and (c) forming an image of the sample based on particles that leave the surface.

Reducing particle implantation

Disclosed herein are methods that include: (a) exposing a sample in a chamber to a first gas, where the first gas reacts with surface contaminants on the sample to form a second gas; (b) removing at least a portion of the second gas from the chamber; and (c) exposing the sample to a charged particle beam to cause a plurality of particles to leave the sample and detecting at least some of the plurality of particles. The charged particle beam can include particles having a molecular weight of 40 atomic mass units or less.

Sample decontamination

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Hollis, NH, United States of America

Lewis A Stern