Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Carl-zeiss-smt Ag

Koninklijke Philips Electronics N.v.

Philips Intellectual Property & Standards Gmbh

Levinus Pieter Bakker

Frank Jeroen Pieter Schuurmans

Vadim Yevgenyevich Banine

Johannes Hubertus Josephina Moors

Ralph Kurt

Derk Jan Wilfred Klunder

Maarten Marinus Johannes Wilhelmus Van Herpen

Jeroen Jonkers

Marcel Mathijs Theodore Marie Dierichs

Michael Cornelis Van Beek

Martinus Bernardus Van Der Mark

Wilhelmus Josephus Box

Lucas Henricus Johannes Stevens

Erik Roelof Loopstra

Vladimir Vitalevitch Ivanov

Jan Evert Van Der Werf

Johannes Catharinus Hubertus Mulkens

Bernardus Hendrikus Wilhelmus Hendriks

Martinus Hendrikus Antonius Leenders

Sjoerd Stallinga

Konstantin Nikolaevitch Koshelev

Sjoerd Nicolaas Lambertus Donders

Christiaan Alexander Hoogendam

Bob Streefkerk

Thomas Koehler

Jeroen Johannes Sophia Maria Mertens

Johannes Jacobus Matheus Baselmans

Joost Jeroen Ottens

Wolfgang Singer

Cornelis Reinder Ronda

Joeri Lof

Aleksey Yurievich Kolesnychenko

Alexander Straaijer

Klaus Simon

Henrikus Herman Marie Cox

Jan-Gerard Cornelis Van Der Toorn

Antonius Theodorus Anna Maria Derksen

Tim Nielsen

Frits Van Der Meulen

Gert Wim 't Hooft

Heine Melle Mulder

Bernhard Johannes Brendel

Antonius Johannes Josephus Van Dijsseldonk

Mark Kroon

Paul Van Der Veen

Markus Weiss

Vladimir Mihailovitch Krivtsun

Robertus Adrianus Maria Wolters

Andy Ziegler

Bastiaan Theodoor Wolschrijn

Bernardus H W Hendriks

Arnoud Cornelis Wassink

Hugo Matthieu Visser

Jakob Vijfvinkel

Jan Van Elp

Peter Cornelis Zalm

Johannes Maria Freriks

Robert Frans Maria Hendriks

Bastiaan Matthias Mertens

Givi Georgievitch Zukavishvili

Bernardus Antonius Slaghekke

Theodorus Hubertus Josephus Bisschops

Martijn Houkes

Johannes Christiaan Leonardus Franken

Carolus Ida Maria Antonius Spee

Gerardus Petrus Matthijs Van Nunen

Johann Trenkler

Wouter Harry Jacinth Rensen

Marius Ravensbergen

Dominik Marcel Vaudrevange

Willem Van Schaik

Yurii Victorovitch Sidelnikov

Paul Peter Anna Antonius Brom

Marc Hubertus Lorenz Van Der Velden

Ronny Ziegler

Adrianus Johannes Henricus Maas

Jun She

Abraham Veefkind

Thomas Steffen

Maarten Marinus Johannes W Van Herpen

Cornelis Petrus Andreas Maria Luijkx

Hugó Matthieu Visser

Yurii Victorvitch Sidelnikov

Adrian Emmanuel Desjardins

Gert 'T Hooft

Adrien E Desjardins

Bernhard J Brendel

Maarten Van Herpen

Derk Klunder

Michael C Van Beek

Martinus B Van Der Mark

Re-calibration of pre-recorded images during interventions uses an interventional system including an imaging device providing images of an object, a needle device, and a processing device. The needle device includes a sensor for providing data corresponding to tissue properties. The processing device is configured to perform an overlay registration of pre-recorded images and live images provided by the imaging device, utilizing the data from the sensor. Thus, the accuracy of an overlay of images is increased.

Re-calibration of pre-recorded images during interventions using a needle device

A device () for imaging the interior of an optically turbid medium is provided. The device comprises a receptacle () structured to accommodate an optically turbid medium for examination and an optically matching medium filling a space between an inner surface () of the receptacle () and the optically turbid medium. The device comprises at least one light source generating light to be coupled into the receptacle () and at least one detector for detecting light emanating from the receptacle (). A coupling surface () optically coupled to the inner surface () of the receptacle and a coupling member () optically coupled to the light source and the detector are provided. The coupling surface () and the coupling member () are movable to a plurality of different positions relative to each other and structured to establish an optical connection from the light source to the inner surface () of the receptacle and from the inner surface () of the receptacle to the at least one detector in the plurality of different positions.

Device for imaging the interior of an optically turbid medium and receptacle unit for such a device

Disclosed is a method and a device for optical imaging of a turbid medium. This method comprises a reference measurement of reference intensities of light emanating from the turbid medium at a reference blood oxygen saturation (SaO2) in the turbid medium and a reference imaging step for reconstructing a reference image of the turbid medium from the measured reference intensities. Furthermore the method comprises a contrast measurement of the contrast intensity of the light emanating from the turbid medium at a contrast blood oxygen saturation (SaO2) level in the turbid medium and a contrast imaging step for reconstructing a contrast image of the turbid medium from the measured contrast intensities. A comparison is made between the contrast image to the reference image of the turbid medium.

Method and device for optical imaging of a turbid medium

An optical element includes a surface including a tilted profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, and a transmissive layer that covers the cavities and the elevations of the optical element. A first height of the transmissive layer in the cavities is substantially equal or larger than the predetermined maximum height difference and the transmissive layer has a second height on the elevations and the second height is about 10-500 nm. The transmissive layer is enabled to optically filter incident radiation, and the optical element is a grating.

Optical element and lithographic apparatus

To overcome the disadvantages introduced by using UV sensors to detect the intensity of UV light in water purification apparatuses, a novel detection apparatus to 'visualize' the quality of water in the form of visible light, instead of digitizing the intensity of UV light includes s a first detection window, coated with a first material for converting a received first ultraviolet light into a first visible light. The first ultraviolet light is emitted from an ultraviolet light source and traverses the liquid, and the detection apparatus further mixes the first visible light with second visible light to generate a third visible light. The different color of the third visible light can represent the different quality of the water.

Detection apparatus and detection method

A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

System and method for detecting at least one contamination species in a lithographic apparatus

A device and method of acquiring image data from a turbid medium using a diffuse optical tomography device including irradiating the turbid medium at a plurality of first spatial positions, collecting light emanating from the turbid medium at a plurality of second spatial positions, splitting the light collected from each second spatial position into at least two optical channels, measuring the intensity of the split light in each optical channel of the at least two optical channels using photo detectors, and reconstructing an image of the turbid medium from the measured intensities.

Device and method for acquiring image data from a turbid medium

An optical element includes a top layer which is transmissive for EUV radiation with wavelength &#x3bb; in the range of 5-20 nm, and a structure of the top layer is a structure having an rms roughness value equal to or larger than &#x3bb;/10 for spatial periods equal to or smaller than &#x3bb;/2. The structure promotes transmission through the top layer to the optical element.

Optical element, lithographic apparatus including such optical element and device manufacturing method, and device manufactured thereby

A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

Illumination system and filter system

A method for removing contaminant particles, such as atoms, molecules, clusters, ions, and the like, produced by a radiation source during generation of short-wave radiation having a wavelength of up to approximately 20 nm, includes guiding a first gas between the radiation source and a particle trap arranged in a wall of a chamber. In order to protect an optical device and/or articles to be irradiated against contamination, the method introducing a second gas into the chamber and its pressure is adjusted such that it is at least as high as the pressure of the first gas.

Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation

A method for manufacturing and/or protecting an optical element, wherein the optical element has at least one surface comprising a profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, includes providing a transmissive layer in the cavities and on the elevations of the optical elements, the transmissive layer having a first height in the cavities that is larger than the predetermined maximum height difference, and surfacing the transmissive layer after providing the transmissive layer such that the transmissive layer has a second height on the elevations that is substantially zero or larger, thereby providing a transmissive layer with a substantially planar surface.

Optical element, lithographic apparatus, method for manufacturing and/or protecting an optical element, device manufacturing method and device manufactured thereby

A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of the substrate; and a first multi-layer mirror and a second multi-layer mirror, the first multi-layer mirror and the second multi-layer minor being arranged along a path of the radiation beam, the first multi-layer minor and the second multi-layer mirror each having a reflectivity of at least about 50% in extreme ultra violet wavelength range, and the first multi-layer mirror configured to reduce radiation having wavelengths in a first wavelength range and the second multi-layer minor configured to reduce radiation having wavelengths in a second wavelength range different from the first wavelength range, wherein the first wavelength range and the second wavelength range are outside extreme ultra violet wavelength range.

Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas.

Radiation system with contamination barrier

The invention relates to a device () for detection of excitation () using a multiple spot arrangement (), in which a multiple spot generator () is matched to the multiple spot arrangement () in such a way that light () entering the multiple spot generator () will be guided to defined areas on the multiple spot arrangement ().

Device for detection of excitation using a multiple spot arrangement

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Helmond, Netherlands

Levinus Pieter Bakker