Asml Netherlands B.v.

Asml Holding N.v.

Asml Holdings N.v.

Lev Sakin

Stanislav Y Smirnov

Mark L Oskotsky

Lev Ryzhikov

Arno Jan Bleeker

Pieter Willem Herman De Jager

Karel Diederick Van Der Mast

Huibert Visser

Jason Douglas Hintersteiner

Borgert Kruizinga

Matthew McCarthy

Bart Snijders

Cheng-Qun Gui

Yuli Vladimirsky

Robert D Harned

Irina I Pozhinskaya

Noreen Harned

Patrick De Jager

John D Martin

An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage and a substrate stage. A magnification reflective optical system images the reticle onto the substrate. The system may be a 2&#xd7; magnification system, or another magnification that is compatible with currently available mask sizes. By writing reticles with circuit pattern dimensions that are one-half the desired size for an FPD, a 2&#xd7; optical system can be used to expose FPDs. The designs for the 1.5&#xd7; and larger magnification optical systems all typically have at least three powered mirrors. A corrector, positioned either near the reticle or near the substrate, can be added to the three mirror design to improve the systems optical performance. The corrector may be a reflective, or a refractive design. The corrector can have an aspheric surface, and optionally a powered surface.

Large field of view 2X magnification projection optical system for FPD manufacture

A lithography system has a magnification module having multiple magnifications at a same time within an object plane, which can include a pattern generator therein. The pattern generator is used to pattern light from an illumination system, which is directed by a projection optical system onto a substrate to form features on a substrate. Having multiple magnifications in the object plate allows for patterning of both large and small features on an image plane, which can include the substrate therein. In one example, an array of pattern generators are used. In this example, substantially an entire surface of the substrate can be patterned with large and small features at substantially a same time.

System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions

An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.

Imaging apparatus

The present invention provides a method and system for determining three-dimensional refractive gradient index distribution. The method and system of the present invention determine inhomogeneity data and calculate index of refraction changes in three-dimensions (3D). The method and system provide 3D modeling of an optical object or system that determines the three-dimensional distribution of the refractive index in the object. In one embodiment, the optical object is a blank. In different embodiments, the optical system is more than one blank. In alternative embodiments, the optical system can be a projection optics system that can include optical components such as lenses, filters, plates, and prisms. The present invention also provides a method for selecting a plurality of preferred optical elements to assemble a composite optical system with predetermined parameters.

Method, system, and computer program product for determining refractive index distribution

Growing community of inventors

Stamford, CT, United States of America

Lev Sakin