Veeco Precision Surface Processing LLC

Veeco Instruments Inc.

Datacolor Holding Ag

Applied Color Systems, Inc.

Lev Rapoport

John Taddei

Laura Mauer

William Gilbert Breingan

John Clark

Chris Hofmeister

Leonard D Butler

A housing of a wafer processing system includes at least one chamber exhaust outlet and at least one chemical exhaust outlet. The chamber exhaust outlet is formed in the housing for venting gas from the interior of the housing and the chemical exhaust outlet is formed in the housing for venting gas that flows along at least one of: (a) a first flow path defined between the splash shield in a raised position and the collection trays in the lowered position; and (b) a second flow path in which the gas flows through the collection chamber to the chemical exhaust outlet.

Semiconductor wafer processing chamber

The use of lead-free solder (flux) in Wafer Level Packaging applications requires more control of the temperature and environment during the reflow process. The flux needs to be applied by spin coating, reflowed in a controlled environment and then removed with a cleaning process. Incorporating these three processes in one compact system provides an efficient and economical solution. The unique design of the reflow oven consists of multiple hotplates and one cold plate, arranged in a circle to allow wafers to proceed through the oven in a rotary fashion.

System and method for flux coat, reflow and clean

An apparatus for filtering dry film solvent includes a hollow vessel having a side wall, an open top end and a second end that includes a main outlet that allows fluid to flow out of a hollow interior of the vessel. A removable cover closes off the open top end of the vessel. The apparatus also includes at least one fluid inlet port formed along the side wall of the vessel and defining an entrance into the hollow interior of the vessel and at least one fluid outlet port formed along the side wall of the vessel and defining an exit from the hollow interior of the vessel. A removable filter member is disposed within the hollow interior and is defined by a frame and filter media that extends across the frame such fluid flowing into the hollow interior through the main inlet must flow through the filter media to reach the main outlet. The filter media is disposed at an angle other than 90 degrees relative to the frame of the filter member.

Apparatus and method to remove undissolved solids from post process dry film strip solvents

In one embodiment, the present invention is a beaker type dyeing machine. One embodiment of an apparatus for dyeing a material in a beaker includes a cylinder body having a first end and a second end, the first end being configured for coupling to the lid of the beaker, a check valve incorporated into the first end of the cylinder body, and a plug incorporated into the second end of the cylinder body, the plug being operable to control opening and closing of the check valve.

Beaker type dyeing machine

A dyeing machine comprises multiple dyeing beakers, a rotating support assembly mounting the beakers, a frame mounting the support assembly for moving the beakers about an axis of rotation, and a dye coupling on the frame for receipt of dye and other chemicals from a dye source. At least one beaker is provided with a dosing hose mounted on the rotating support assembly for supplying the beaker with a dye and other chemicals during movement of the rotating support assembly. In addition, a receiving end of the dosing hose is in fluid communication with the dye coupling.

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Yardley, PA, United States of America

Lev Rapoport