Gatan, Inc.

Applied Materials, Inc.

Leszek Malaszewski

Reza Alani

Richard John Mitro

Shigeru Suzuki

James G Rietzel

Ronald Zolkowski

Barbara Louise Armbruster

Robert Michael Kozar

An apparatus and method for controlling local deposition rate in a physical vapor deposition process is provided. A magnet bar assembly is disposed inside a sputtering target. The magnet bar assembly comprises a magnet bar, a support member aligned with the magnet bar, and one or more sliding brackets that couple the support member to the magnet bar. Each sliding bracket compresses the magnet bar to the support member, allowing the use of spacers between the support member and the magnet bar to adjust local proximity of the magnet bar to the plasma bombarding the target.

Magnet bar support system

A side-entry specimen holder for transmission electron microscopy is provided. The specimen holder is capable of rotating a specimen and tilting it in two axes. The specimen, when mounted in the holder, can be tilted in the plus/minus direction of the X-axis, the plus/minus direction of the Y-axis, and simultaneously have the ability of 360&deg; rotation in the axis of the electron beam to permit alignment of microstructural features of the specimen for optimal viewing and analysis.

Double tilt and rotate specimen holder for a transmission electron microscope

An apparatus and process for the etching and coating of samples in a single vacuum chamber, thus minimizing handling and transfer of the samples is provided. The apparatus includes a sealed chamber and a vacuum pump for forming and maintaining a vacuum in the chamber, a first ion gun positioned in the chamber to etch a sample, a sputtering target in the chamber, and at least one additional ion gun positioned in the chamber to cause material from the target to be directed onto the sample.

Apparatus for etching and coating sample specimens for microscopic

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Walnut Creek, CA, United States of America

Leszek Malaszewski