Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

Asml Netherlands B.v.

Leonard Ferdinand Gerard Geers

Marc Crockatt

Axel Sebastiaan Lexmond

Sjoerd Nicolaas Lambertus Donders

Johannes Henricus Wilhelmus Jacobs

Jan Cornelis Van Der Waal

Earl Lawrence Vincent Goetheer

Ruud Cuypers

Cornelis Petrus Marcus Roelands

Johan Urbanus

Johannes Van Der Meer

Laurens Daniël Van Vliet

Carol Andrea Roa Engel

Pavol Bodis

Martin Mohana

Rudolf Gijsbertus Van Someren

Arie Jacobus Kalkman

Roberta Veronezi Figueiredo

Lucie Prins

Lauran Kwakernaat

The invention is directed to a system for energy storage comprising a chemical combustion reactor comprising a reactor segment that comprises at least two porous active fixed beds that are separated by an inactive insulating layer which are at least partially surrounded by an insulating mantle. The active beds comprise a metal and/or oxide thereof.

Internal configuration for redox-based heat storage systems

The invention is directed to a process for the continuous preparation of a cycloadduct product from the reaction of a furanic with a dienophile, comprising heating a first liquid feed stream comprising the dienophile and a solvent in which the dienophile is dissolved; providing a second liquid feed stream comprising the furanic; leading the first liquid feed stream and the second liquid feed stream into a continuous reactor to produce a product solution stream comprising the cycloadduct product; and leading the product solution stream to an product isolation zone to produce an isolated cycloadduct product. A further aspect of the invention is an apparatus for carrying out this reaction.

Continuous process for cycloaddition reactions

The invention is based on the finding that when conducting crystallization of FDCA at high temperatures, the formation of significant amounts of colored byproduct can be reduced or even avoided when the FDCA mixture is kept at temperatures above 100&#xb0; C. for less than 15 minutes. This is achieved by conducting the crystallization process in a continuous reactor. Accordingly, the method comprises the steps of feeding a mixture comprising undissolved FDCA and a solvent to a reactor; and dissolving FDCA by superheating the mixture in the reactor to a temperature of at least 130&#xb0; C.; and crystallizing FDCA by cooling the mixture in the reactor, wherein the reactor is a continuous reactor and the residence time in the reactor zone wherein the FDCA mixture has a temperature above 100&#xb0; C. is less than 15 minutes.

Method for purifying and removing color of FDCA

The invention is directed to a method for carrying out a continuous physical or chemical process, in particular crystallization. The method of the invention comprises: comprising&#x2014;flowing a fluid through a channel comprising an inlet and an outlet for said fluid, wherein said channel is at least in part curved and comprises at least two curvatures,&#x2014;allowing said process to occur at least in part in said fluid in the presence of Dean vortices in said fluid, while&#x2014;reversing the direction of the flow of said fluid in said channel multiple times, wherein Dean vortices in the fluid in the channel are maintained while the flow is reversed.

Fluid flow continuous physical or chemical processes using dean vortices

A lithographic projection apparatus is disclosed that comprises a substrate table, a projection system, a liquid confinement structure and a thermal measurement system. The substrate table is configured to support a substrate. The projection system is configured to direct a patterned beam of radiation on to a target portion of the substrate. The liquid confinement structure is configured to at least partly confine an immersion liquid to a space between the projection system and the substrate, the substrate table, or both. The thermal measurement system comprises a thermally sensitive coating. The thermal measurement system is configured to detect the temperature of the immersion liquid in contact with the coating. Also disclosed is a thermal measurement system, a metrology system comprising the thermal measurement system and a dummy wafer for the thermal measurement system.

Lithographic apparatus, a metrology apparatus and a method of using the apparatus

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Valkenburg, Netherlands

Leonard Ferdinand Gerard Geers