Kla Corporation

Leon Yu

Bjorn Brauer

Kenong Wu

Eugene Shifrin

Hong Chen

Xiaochun Li

James A Smith

Nurmohammed Patwary

Ramon Ynzunza

Michael Cook

Wei Si

Qing Luo

Neil Troy

Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) configured for performing at least one repeater defect detection step in front-end processing during an inspection process performed on a wafer having features printed in a lithography process using a reticle. The at least one repeater defect detection step performed in the front-end processing includes identifying any defects detected at corresponding locations in two or more test images by double detection and any defects detected by stacked defect detection as first repeater defect candidates. One or more additional repeater defect detections may be performed on the first repeater defect candidates to generate final repeater defect candidates and identify defects on the reticle from the final repeater defect candidates.

Print check repeater defect detection

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Shanghai, China

Leon Yu