Fei Comapny

Leon Van Kouwen

Gregory A Schwind

Sean Kellogg

Gerard Nicolaas Anne Van Veen

Aurelien Philippe Jean Maclou Botman

Luigi Mele

Aurélien Botman

A source assembly for ion beam production is disclosed herein. An example source assembly may include a pair of plates separated by a distance, with each plate having an aperture, and the respective apertures aligned, and an ionization space defined at least by the distance and the respective apertures, where a ratio of the distance to an ionic mean free path of a gas in the ionization space is greater than one.

Innovative source assembly for ion beam production

A collision ionization source is disclosed herein. An example source includes an ionization region arranged to receive a gas and a charged particle beam, the charged particle beam to ionize at least some of the gas, and a supply duct arranged to provide the gas to the ionization region, the supply duct having a non-uniform height decreasing from an input orifice to an output orifice, the output orifice arranged adjacent to the ionization region.

Collision ionization source

A source assembly for producing an ion beam and comprising a collision ionization ion source having: The various sources in said plurality preferably have a scattering quotient Q=d/lwith a value in a range 1-500, preferably in a range 1-200, where lis an ionic mean free path length in said ionization space.

A collision ionization ion source comprising:

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Rotterdam, Netherlands

Leon Van Kouwen