Asml Netherlands B.v.

Leon Martin Levasier

Erik Roelof Loopstra

Rene Oesterholt

Franciscus Johannes Joseph Janssen

Arie Jeffrey Den Boef

Nicolaas Ten Kate

Martinus Hendrikus Antonius Leenders

Joost Jeroen Ottens

Wim Tjibbo Tel

Frank Staals

Kaustuve Bhattacharyya

Andre Bernardus Jeunink

Koen Jacobus Johannes Maria Zaal

Jan Bernard Plechelmus Van Schoot

Marcel Beckers

Tjarko Adriaan Rudolf Van Empel

Henricus Petrus Maria Pellemans

Han-Kwang Nienhuys

Adrianus Hendrik Koevoets

Yuri Johannes Gabriël Van De Vijver

Irwan Dani Setija

Hoite Pieter Theodoor Tolsma

Marcio Alexandre Cano Miranda

Emil Peter Schmitt-Weaver

Martinus Agnes Willem Cuijpers

Danny Maria Hubertus Philips

Stefan Geerte Kruijswijk

Roger Wilhelmus Antonius Henricus Schmitz

Manish Ranjan

Oleg Voznyi

Alain Louis Claude Leroux

Albert Pieter Rijpma

Kursat Bal

Oleksiy Galaktionov

Ingo Dirnstorfer

Sjoerd Nicolaas Lambertus Donders

Bob Streefkerk

Johannes Henricus Wilhelmus Jacobs

Alexander Straaijer

Raymond Wilhelmus Louis Lafarre

Henrikus Herman Marie Cox

Timotheus Franciscus Sengers

Frits Van Der Meulen

Wilhelmus Josephus Box

Marinus Aart Van Den Brink

Bernardus Antonius Johannes Luttikhuis

Siegfried Alexander Tromp

Gerrit Johannes Nijmeijer

Frederik Eduard De Jong

Laurentius Johannes Adrianus Van Bokhoven

Jim Vincent Overkamp

Sander Catharina Reinier Derks

Wilhelmus Petrus De Boeij

Ralph Brinkhof

Maurice Willem Jozef Etiënne Wijckmans

Marcel Hendrikus Maria Beems

Anastasius Jacobus Anicetus Bruinsma

Edwin Cornelis Kadijk

Christianus Wilhelmus Johannes Berendsen

Marcel Johannus Elisabeth Hubertus Muitjens

Johannes Wilhelmus De Klerk

Jan Cornelis Van Der Hoeven

Petrus Rutgerus Bartray

Henricus Jozef Castelijns

Yim Bun Patrick Kwan

Peter Franciscus Wanten

Josephus Jacobus Smits

Nicolas Alban Lallemant

Jacobus Cornelis Gerardus Van Der Sanden

André Schreuder

Wilfred Edward Endendijk

Jacob Fredrik Friso Klinkhamer

Peter Gerardus Jonkers

Rob Jansen

Hubertus Antonius Geraets

Johannes Bernardus Ridder

Nicolaas Antonius Allegondus Johannes Van Asten

Leon Joseph Marie Van Den Schoor

David Lucien Anstotz

Luberthus Ouwehand

Edwin Teunis Van Donkelaar

Dennis Jozef Maria Paulussen

Peter Schaap

Erik Johan Arlemark

Gerardus Martinus Antonius De Rooij

Elke Van Loenhout

Marteijn De Jong

Alex Oudshoorn

Roland Blok

Jacobus Burghoom

Petra Albertina Margaretha Dekkers-Rog

Richard Bernardus Johannes Droste

Anthonie Aantjes

Hugues Poincelin

Fransiscus Theresia Noel Heusschen

Evert Hendrink Jan Draaijer

Koenraad Stephan Silvester Salden

Rogier H M Groeneveld

A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.

Methods and apparatus for monitoring a lithographic manufacturing process

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation

A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

Lithographic apparatus and device manufacturing method

An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.

The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.

Device manufacturing method, lithographic apparatus and a computer program

A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.

Lithographic apparatus and method for calibrating the same

A radiation beam modification apparatus for controlling a property of a beam of radiation in a lithographic apparatus includes a flexible sheet provided with a plurality of apertures, and a positioning apparatus comprising a first rotatable member and a second rotatable member, wherein a first end portion of the flexible sheet is coupled to the first rotatable member, a second end portion of the flexible sheet is coupled to the second rotatable member and a central portion of the flexible sheet extends between the first rotatable member and the second rotatable member. The apertures may be used to control the numerical aperture of a projection system of a lithographic apparatus.

Radiation beam modification apparatus and method

A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.

A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.

A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

Lithographic apparatus and method for manufacturing a device

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Hedel, Netherlands

Leon Martin Levasier