Obducat Ab

Skindicator Ab

Cd-sverige Aktiebolag

Lennart Olsson

Babak Heidari

Peter Andersson

Sven Van Dijkman

Rizgar Nabi Jiawook

Bo Wikstr&ouml;m

The present disclosure relates to a device and method for detecting chemicals from tissue, such as skin, comprising at least a first detector (A) and at least a second detector (B), wherein the first detector (A) and the second detector (B) are the same type of detectors. An attachment portion (C) including at least the first detector (A) and at least the second detector (B) separated by a defined distance, the attachment portion is configured to be attached on the tissue for detection of the chemicals.

Device and a method for detection of changes in tissue

A device () for transferring a pattern to an object (). The invention relates especially to production of micro and nanostructures. The device comprises an alignment means () arranged in connection with a first contacting means () for controlling the motion of the first stamp () in a direction perpendicular to the pressing direction (A), and a second contacting means () having a second stamp () adapted to imprint a second pattern in the second surface () of the object (), and a pressing means () further adapted to press the second stamp () into contact with the second surface () of the object () in the pressing direction (A). Hereby is obtained a device of a simple design, which has a high accuracy of the alignment of the stamps in relation to the object.

Device for transferring a pattern to an object

A method and device for forming an optical or magnetic memory medium or a template for making such memory media, including suspending an essentially flat substrate rotatably about an axis, arranging a particle beam source to expose the surface layer to a particle beam, rotating the substrate such that the particle beam forms a groove in the surface layer by exposure to a predetermined degree, which groove has a width on the order of 1-100 nm, and controlling the position of the particle beam and the axis relative to each other, during rotation of the substrate about the axis so that part of the groove is subjected to more than one exposure to the particle beam, whereby the groove is formed as a sum of said more than one exposure, which sum corresponds to said predetermined degree of exposure.

Method and device for forming optical or magnetic memory media or a template for the same

There is provided a device for transferring a pattern from a stamp to a substrate, provided with a moldable film, by pressing the stamp and the substrate against each other. The device comprises at least one fixture for retaining a planar object such as the stamp or the substrate. The device is distinguished in that it comprises a heating element for heating the planar object, and measuring arrangement for determining a change in the size of the planar object due to the heating.

Devices and methods for aligning a stamp and a substrate

An imprint process comprises the step of aligning a substrate, supported on a first support member, with a template, supported on a second support member. The substrate has at least one essentially plane surface provided with a moldable film. The template has at least one essentially plane surface provided with a relief pattern. The relief pattern is adapted to interact with the moldable film. The process further comprises the step of arranging a sealing gasket between the template and the second support member, such that a pressure cavity is defined by the second support member, the template and the sealing gasket. The process also comprises the step of applying a static gas pressure to the pressure cavity, in order to provide a pressure between the template and the substrate. The pressure is sufficient to form a pattern in the moldable film. An imprint device is also disclosed.

Imprint method and device

A method and a device for forming at least a first pattern on a substrate (), which is coated with a layer () on at least a first planar surface, are described. According to the method, a first pressing means () is arranged with a first structure () that defines the pattern, and the substrate () is arranged so that the first pressing means () is separated from the substrate () and so that the first pressing means () and the substrate () are unable to move transversely of the common center line () but are able to move freely in a direction along the center line (). Subsequently, the first pressing means () is contacted with the substrate () while maintaining the common center line, and a pressure is applied to the substrate () and the first pressing means () to form said at least one pattern in the layer ()

Method for transferring a pattern

A method of making, by etching, depressions in selected portions of an etching surface of an electrically conductive etching material, the depressions forming an etching pattern, comprises the step of contacting the etching material with an etchant. A passivating layer is formed on the etching material which layer decreases or stops the etching capability of the etchant on the surface and which is dissolved in a chemical reaction when exposed to electromagnetic radiation. An electrode with electrically conductive electrode portions in selected portions of an electrode surface is provided, the electrode portions forming an electrode pattern corresponding to the etching pattern. The electrode is arranged in contact with the etchant and with the electrode portions facing the etching surface of the etching material, an electric voltage is applied between the electrode and the etching material, and the etching material is exposed to electromagnetic radiation essentially perpendicular to the etching surface.

Method and apparatus for etching

An electronics device comprising a carrier, such as a printed circuit board, a substrate or a chip, and an electric conductor on a surface of the carrier. The surface of the conductor ( ) facing away from the carrier has a surface structure ( ) in the form of flanges which are defined by etched grooves.

Electric conductor with a surface structure in the form of flanges and etched grooves

In a method for anisotropic etching of a structure in an electrically conductive substance to be etched, use is made of an etchant which in concentrated solution is usable for isotopic etching of structures in the substance to be etched. The substance to be etched is contacted with the etchant in a solution which is so diluted that the etchant is unusable for isotropic etching. The etchant is subjected, adjacent to the substance to be etched, to an electric field of such a strength that anisotropic etching of the substance to be etched is accomplished. Moreover, an etching fluid is described, comprising an etchant in dilute solution, in which the etchant is present in a concentration of 200 mM at most, and use of such an etching fluid for making structures which are 50 &mgr;m or less is also described.

Growing community of inventors

Malmö, Sweden

Lennart Olsson