Boe Technology Group Co., Ltd.

Hefei Xinsheng Optoelectronics Technology Co., Ltd.

Beijing Boe Technology Development Co., Ltd.

Boe Technology Groupco., Ltd.

Leilei Cheng

Dongfang Wang

Qinghe Wang

Bin Zhou

Yang Zhang

Guangcai Yuan

Liangchen Yan

Tongshang Su

Guangyao Li

Yongchao Huang

Wei Li

Jun Feng Liu

Ce Zhao

Ning Liu

Luke Ding

Yingbin Hu

Yuankui Ding

Ming Wang

Wei Song

Jingang Fang

Jun Cheng

Tao Sun

Rui Peng

Jun Liu

Min He

Liusong Ni

Heekyu Kim

Zhiwen Luo

Jun Bao

Yongqian Li

Can Yuan

Ming Hsi Wang

Dacheng Zhang

Kai Xu

Chao Wang

Haitao Wang

Wenbin Jia

Xinwei Gao

Xinxin Wang

Chun Cao

Yadong Liang

Junlin Peng

Daqing Hu

Jiawen Song

Disclosed are a preparation method thereof, a display panel, and a display device. The drive backboard comprises: a pixel circuit disposed on a base substrate; an anode disposed on a side of the pixel circuit facing away from the base substrate and electrically connected to the pixel circuit; and a first insulating layer disposed between the base substrate and the anode; the first insulating layer is provided with a groove surrounding the pixel circuit, the anode covers the first insulating layer, and an edge of the anode extends to an inner wall of the groove.

Drive backboard, preparation method thereof, display panel, and display device

A display substrate includes: a base; a cathode power line disposed on the base and located in the peripheral region; a first insulating layer located on a side of a layer in which the cathode power line is located away from the base and having first via hole(s); a cathode layer located on the first insulating layer and electrically connected to the cathode power line through the first via hole(s); and spacer(s) located on a side of the cathode layer proximate to the base, a spacer covering at least a side wall of a first via hole, a thickness of a portion of the spacer covering the side wall decreasing along the side wall and in a direction pointing from an end of the side wall proximate to the base toward an end of the side wall of the first via hole away from the base.

Display substrate with spacers on cathode power line and display apparatus

The disclosure relates to the technical field of display, in particular to a displaying substrate, a manufacturing method thereof and a display panel. The displaying substrate comprises a passivation layer () and a flat layer () covering the passivation layer (), wherein the flat layer () comprises a first flat via hole and a plurality of second flat via holes, the passivation layer () comprises a first passivation via hole, and the first flat via hole and the first passivation via hole form a first sleeve hole (); and the hole depth of the first flat via hole is smaller than that of each second flat via hole, and the hole depth of the first passivation via hole is greater than or equal to the difference between the maximum hole depth of all the second flat via holes and the hole depth of the first flat via hole.

Displaying substrate, manufacturing method thereof and display panel

A manufacturing method of a display substrate, a display substrate, and a display device. The manufacturing method includes: forming an active layer; forming a gate insulation film layer, a gate film layer and a photoresist film layer; exposing the photoresist film layer to a light and developing the exposed photoresist film layer until the developed photoresist film layer has a thickness of 1.8-2.2 μm and a slope angle not less than 70°; over-etching the gate film layer to form a gate electrode, an orthographic projection of the gate electrode being located within a region of an orthographic projection of the developed photoresist film layer; over-etching the gate insulation film layer by a gaseous corrosion method to form a gate insulation layer; peeling off the photoresist film layer remaining on a surface of the gate electrode; and performing a conductive treatment to the active layer.

Manufacturing method of display substrate, display substrate and display device

Disclosed are a display substrate and a manufacturing method therefor, and a display device. The display substrate comprises: a substrate base, and an active layer, a gate insulating layer, a first metal film layer, an interlayer insulating layer, a second metal film layer, and a passivation layer stacked in sequence on the substrate base. The first metal film layer comprises a pattern of a gate and a gate line. The second metal film layer comprises a pattern of a source/drain and a data line. The gate line and the data line are partially arranged opposite to each other. An oxide metal layer is provided on the surface of the side of the region of the gate line opposite to the data line facing the data line.

Display substrate and manufacturing method therefor, and display device

A display panel and a fabricating method thereof, and a displaying device. The display panel includes a substrate, a resistance reducing trace, an inter-layer-medium layer and a signal line. The substrate is divided into a plurality of sub-pixel regions and a pixel separating region. The resistance reducing trace is provided on the pixel separating region of the substrate. The inter-layer-medium layer is provided on the substrate, and the inter-layer-medium layer has an opening exposing the resistance reducing trace. The signal line is provided within the opening, the signal line is connected to the resistance reducing trace, the signal line is distributed in a column direction along the display panel, and in a row direction along the display panel, a width of the opening is greater than or equal to a width of the signal line.

Display panel with resistance-reducing trace and signal line configured to reduce peel-off, and fabricating method thereof, and displaying device

A method for manufacturing a display panel includes: sequentially forming a conductive pattern, a light-emitting layer and a cathode layer on a substrate. The conductive pattern is formed by a one-time patterning process, and includes an auxiliary electrode layer. In a direction parallel to the substrate, both the first protective electrode and the second protective electrode in the auxiliary electrode layer extend over the metal electrode, a second orthographic projection of the second protective electrode on the substrate is within a first orthographic projection of the first protective electrode on the substrate, and an outer boundary of the second orthographic projection is staggered from an outer boundary of the first orthographic projection. The cathode layer is in contact with the first protective electrode and a sidewall of the metal electrode.

Display panel, method for manufacturing same, and display apparatus

A light-emitting device includes: an anode disposed on a base, and a cathode disposed on a side of the anode facing away from the base. The anode includes a light-reflecting sub-electrode and a light-transmitting sub-electrode located on a surface of the light-reflecting sub-electrode facing away from the base, and an orthographic projection of the light-transmitting sub-electrode on the base is located within a range of an orthographic projection of the light-reflecting sub-electrode on the base. The light-reflecting sub-electrode includes a metal pattern and a metal oxide pattern, and the metal oxide pattern is located in at least part of a region around the metal pattern.

Light-emitting device and method for manufacturing the same, and display panel

A sterilization structure, a sterilization board, and a display device are disclosed. The sterilization structure includes an active layer, wherein, one surface of the active layer has an exposed region, and a material of the active layer includes a laser-induced graphene material.

Sterilization structure, sterilization board and display device

A method of manufacturing an array substrate is provided, which comprises: forming a first metal layer and an insulating layer in sequence on a base substrate, the insulating layer covering the first metal layer; forming an etch barrier layer on the insulating layer; etching the etching barrier layer and the insulating layer multiple times, wherein an effective blocking area of the etching barrier layer decreases successively in each etching to form a connection hole penetrating the insulating layer, the connection hole includes a plurality of via holes connected in sequence, and a slope angle of a hole wall of each via hole is smaller than a preset slope angle; and forming a second metal layer, the second metal layer being connected to the first metal layer through the connection hole.

Method of manufacturing array substrate, and array substrate

The present invention relates to the field of display technologies, and provides an array substrate, a manufacturing method thereof, and a display device. The array substrate includes a first electrode layer. The first electrode layer may include an indium tin oxide layer and a planarization layer. The indium tin oxide layer is disposed on a substrate and includes indium tin oxide particles; the planarization layer is disposed on a side of the indium tin oxide layer away from the substrate, and fills at least part of gaps between the indium tin oxide particles, and the planarization layer can conduct electricity.

Array substrate having enhanced light extraction efficiency, preparation method therefor, and display device

An array substrate, a manufacturing method thereof, and a display device are provided. The array substrate includes: a base substrate; a first signal line on the base substrate; a first buffer layer provided on the base substrate and covering the first signal line; a second signal line on a side of the first buffer layer facing away from the base substrate; a first insulating layer provided on the base substrate and covering the second signal line; and a thin film transistor on a side of the first insulating layer facing away from the base substrate, the thin film transistor including a gate electrode, a source electrode and a drain electrode. A thickness of the first signal line is greater than that of the gate electrode, and a thickness of the second signal line is greater than that of the source electrode or the drain electrode.

Array substrate, manufacturing method thereof, and display device

An array substrate includes an insulation layer and one or more stepped holes each penetrating through the insulation layer in a direction perpendicular to the insulation layer. Each stepped hole includes a first hole and a second hole under the first hole, a radius of the first hole at a bottom is a first radius, a radius of the second hole at a top is a second radius which is substantially smaller than the first radius, and a difference between the first radius and the second radius is 0.2 &#x3bc;m to 0.6 &#x3bc;m.

Array substrate, display panel, and manufacturing method of the array substrate

The present disclosure is related to a thin film transistor. The thin film transistor may include an active layer; a gate insulating layer on the active layer; and a gate and a plurality of metal films on the gate insulating layer. The plurality of metal films may be spaced apart from the gate, and insulated from the gate and the active layer.

Thin film transistor, fabricating method thereof, and display apparatus

The present disclosure relates to a pixel structure. The pixel structure may include a base substrate; a first insulating island on a side of the base substrate; a first electrode on a side of the first insulating island opposite front the base substrate; a second electrode on the base substrate and at a peripheral area of the first insulating island; an active layer electrically connected to the first electrode and the second electrode; a second insulating layer on a side of the active layer opposite from the base substrate; a gate electrode on a side of the second insulating layer opposite from the base substrate; and a third insulating layer on a side of the gate electrode opposite from the base substrate.

Display substrate, manufacturing method thereof, and display apparatus

Growing community of inventors

Beijing, China

Leilei Cheng