Shanghai Energy New Materials Technology Co., Ltd.

Shanghai Huahong Grace Semiconductor Manufacturing Corporation

Lei Xiong

Alex Cheng

Fangbo He

Honggui Deng

Weiqiang Wang

Pei Xi

Zhenxing Zhang

Lihua Wang

Ting Shi

Jianpeng Wang

The present invention provides a porous membrane for water treatment, comprising: a high molecular weight polyethylene, a water-soluble polymer and an antioxidant, the high molecular weight polyethylene having an average molecular weight of 1.0&#xd7;10to 10.0&#xd7;10and a density of 0.940 to 0.976 g/cm; wherein, the weight of the water-soluble polymer is 5 to 50 parts, the weight of the antioxidant is 0.1 to 10 parts, based on 100 parts of the weight of the high molecular weight polyethylene. The porous membrane for water treatment prepared by the present invention has a thickness of 5 to 30 &#x3bc;m, a pore size of 10 to 100 nm, a porosity of 20 to 60%, and a surface contact angle of 30&#xb0; to 95&#xb0;. The porous membrane according to the present invention has good durability, simple preparation process, and relatively thin thickness, a uniform pore size distribution and small pore size, good hydrophilicity, as well as good filtration and adsorption effect.

Porous membrane for water treatment and method for preparing the same

Disclosed in present invention are a high-wettability separator and a preparation method therefor. The separator comprises an ethylene copolymer, a grafting polyolefin, an ultrahigh molecular weight polyethylene having a molecular weight ranging from 1.0&#xd7;10to 10.0&#xd7;10, and a high-density polyethylene having a density ranging from 0.940 g/cmto 0.976 g/cm, the content of the ethylene copolymer is 1-5 parts by weight, and the content of the grafting polyolefin is 0-5 parts by weight, on the basis that the total weight of the ultrahigh molecular weight polyethylene and the high-density polyethylene is 100 parts. The separator has a contact angle with lithium ion battery electrolyte of 20&#xb0; to 40&#xb0;.

High-wettability separator and preparation method thereof

The invention discloses a separator with a wide temperature range and a low heat shrinkage and a method for preparing the same. The invention belongs to the field of electrochemistry. The separator of the invention includes: an irradiation crosslinked fluoropolymer A with a melting point above 150&#xb0; C. and/or a polymer B containing a benzene ring in its main chain; an ultrahigh molecular weight polyethylene having a molecular weight of 1.0&#xd7;10-10.0&#xd7;10, and a high density polyethylene having a density in the range of 0.940-0.976 g/cm; the temperature difference between pore closing temperature and film breaking temperature of the separator is 80-90&#xb0; C., preferably 85-90&#xb0; C., the heat shrinkage of the separator is 2.0% or less. The separator of the invention has a high temperature difference between film breaking temperature and pore closing temperature, and a low heat shrinkage; when the separator of the invention is used in an electrochemical device, the reliability and safety of electrochemical device can be effectively improved.

Separator with wide temperature range and low shrinkage as well as method for preparing the same

The invention discloses a polymer electrolyte membrane and a method for preparing the same. The method comprises the steps of: (1) mixing a molecular sieve material, a polymer and a solvent to obtain a slurry; (2) coating the slurry on a base membrane to form a wet membrane; (3) drying the wet membrane to obtain a dry membrane; and (4) immersing the dry membrane in a lithium salt electrolyte solution, and taking out to obtain a polymer electrolyte membrane.

Polymer electrolyte membrane and method for preparing same

A method for forming a magnetic sensor includes: forming a hard mask film on a tantalum nitride film; forming a patterned photoresist layer on the hard mask film; implementing an isotropic dry etching process to the hard mask film by taking the photoresist layer as a mask, so as to form a hard mask layer; and implementing an etching process to the tantalum nitride film and the magnetic film by taking the hard mask layer as a mask, so as to form a tantalum nitride layer and a magnetic resistive layer. As an isotropic dry etching process is implemented to the hard mask film, the hard mask film located which is above the other sidewalls and is not used for forming the magnetic sensor can be effectively removed. In addition, shadow effect will not take place, thus dimension of the magnetic sensor formed is able to be easily controlled.

Method for forming a magnetic sensor

A method of forming a micro-electro-mechanical systems (MEMS) device includes: providing a substrate; forming a tantalum nitride (TaN) layer on the substrate; forming a dielectric anti-reflective coating (DARC) layer on the TaN layer; coating photoresist on the DARC layer and etching the DARC: and TaN layers to form a trench; performing intensified ashing and wet cleaning processes to remove the photoresist and the DARC layer. The DARC layer can prevent the formation of tantalum-containing polymeric substances from a reaction between the TaN layer and the photoresist during the intensified ashing process.

Methods of forming MEMS device

A method of forming a micro-electro-mechanical systems device includes: providing a substrate; sequentially forming a tantalum nitride (TaN) layer and a hard mask layer on the substrate, the hard mask layer having a thickness larger than a thickness of the TaN layer; coating photoresist on the hard mask layer, patterning the photoresist and performing a first etching process on the hard mask layer with the photoresist serving as a mask to form an opening in the hard mask layer, wherein a portion of the thickness of the hard mask layer is remained under the opening; removing the photoresist; and performing a second etching process to remove the portion of the thickness of the hard mask layer under the opening as well as a portion of the TaN layer under the opening to form a trench.

Growing community of inventors

Shanghai, China

Lei Xiong