Shanghai University

Advanced Micro-fabrication Equipment Inc, Shanghai

Jining University

Advanced Micro-fabrication Equipment Inc. China

Lei Wan

Jun Luo

Shaorong Xie

Hengyu Li

Xiaoming He

Jingyi Liu

Zhaoyang Xu

Yueying Wang

Ping Yang

Jun Liu

Hanting Zhang

Tuqiang Q Ni

Rason Zuo

Xingjian Chen

Shenjian Liu

Disclosed is a method for constructing a bionic binocular active visual simultaneous localization and mapping (SLAM) system. The method includes: S1, constructing a binocular active visual system, peripheral vision is simulated using a panoramic camera, a panoramic value map is constructed based on the panoramic camera, and a binocular bionic eye gaze control strategy based on the panoramic value map is proposed; S2, designing a SLAM algorithm framework which is suitable for motion of the two bionic eyes, where relative pose optimization of left and right cameras based on a Perspective-n-Point algorithm and depth calculation for binocular matching points based on triangulation are adopted in a SLAM tracking thread; and S3, with the assistance of camera poses estimated by the SLAM system and sparse landmark point coordinates, training a self-supervised depth estimation network, to provide dense depth estimation for a mapping module of the SLAM system, achieving dense mapping.

Self-supervised image depth estimation method based on channel self-attention mechanism

Disclosed is an active positioning method for bionic binocular vision during execution of a simultaneous localization and mapping (SLAM) task. The method includes: capturing a panoramic image using a panoramic camera and detecting key scene information; assigning values to pixels in the panoramic image to obtain a panoramic value map; projecting field-of-view areas of left and right bionic eye cameras separately onto the panoramic value map, to obtain a current binocular field-of-view projection area; calculating a mean value of the current binocular field-of-view projection area in the panoramic value map; comparing the mean value of the current binocular field-of-view projection area with a value threshold, and obtaining a binocular field-of-view projection area with a mean value higher than the value threshold by moving the binocular bionic cameras; and finally using a high-value image captured by the left and right bionic eye cameras as an input of a SLAM system.

Active positioning method for bionic binocular vision during execution of SLAM task

Embodiments of the present disclosure disclose a plasma process apparatus with low particle contamination and a method of operating the same, wherein the plasma process apparatus comprises a chamber body and a liner, wherein a dielectric window is provided above the liner; the chamber body, the liner, and the dielectric window enclose a reaction space; a base for placing a wafer is provided at a bottom portion inside the reaction space; a vacuum pump device for pumping a gas out of the reaction space and maintaining a low pressure therein is provided below the base; a shutter for shuttering between an opening on a chamber body sidewall and an opening on a liner sidewall is provided inside the chamber body, for blocking contamination particles in the gas from flowing from a transfer module to the reaction space; a groove is provided at a lower portion of the liner, wherein a flowing space enclosed by a liner outer wall below the shutter and a chamber body inner wall is in communication with an inner space of the liner via the groove to form a gas flow path, such that the contamination particles entering the flowing space are pumped away by the vacuum pump device via the gas flow path. The present disclosure may not only keep the current wafer free from being contaminated, but also may reduce contamination for a next wafer transfer; besides, it enables introduction of clean air to make the contamination particles carried out of the reaction space with a more significant effect and a higher efficiency.

Plasma process apparatus with low particle contamination and method of operating the same

An advanced coating for parts used in plasma processing chamber. The advanced coating is formed over an anodized surface that has not been sealed. After the coating is formed, the coated area is masked, and the remaining anodized surface is sealed. The porous and rough structure of the anodized but un-sealed aluminum enhances adhesion of the coating. However, to prevent particle generation, the exposed anodized surface is sealed after formation of the coating. The coating can be of yttria, formed by plasma enhanced atomic deposition techniques which results in a dense and smooth coating.

Coating packaged chamber parts for semiconductor plasma apparatus

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Shanghai, China

Lei Wan