International Business Machines Corporation

Pepsico, Inc.

Orthozon Technologies, LLC

Mantis Health, Inc.

Lee Matthew Nicholson

John Anthony Fitzsimmons

Anthony K Stamper

Jeffrey P Gambino

Edward Crandal Cooney, Iii

Daniel C Edelstein

Timothy Joseph Dalton

Andrew Herbert Simon

Sujatha Sankaran

Sampath Purushothaman

Matthew Earl Colburn

Elbert Emin Huang

Thomas M Shaw

Satyanarayana Venkata Nitta

Vincent James McGahay

Michael Wayne Lane

Joshua Aferzon

Wei Liu

Stephen Ellinwood Luce

Thomas L McDevitt

Christy Sensenich Tyberg

Wei-Tsu Tseng

Peter S Given

Prasad V Joshi

Denise H Lefebvre

Marcin Jankowiak

Theodorus E Standaert

Naftali Eliahu Lustig

Stephen Edward Greco

Joseph Aferzon

Wojciech A Wilczak

Edward Paul Barth

Tze-man Ko

Arthur W Martin

Pegeen M Davis

Frank Schloss

Jason Haslow

Manish Marotrao Pande

Stereoscopic visualization apparatus

Stereoscopic system including a portal component, first sensor and first cable, second sensor and second cable, first display and second display. The portal component includes an axis, a first channel and second channel extending along the axis. The first sensor is secured within the first channel at a first angle with respect to the axis and directed inwardly toward a location. The first cable extends from the first sensor. The second sensor is secured within the second channel at a second angle with respect to the axis and directed inwardly toward the location. The first angle and second angle converge at the location to define a depth of perception. The second cable extends from the second sensor. The first display structure is disposed in proximity to a left aperture of an eyeframe, and the second display structure is disposed in proximity to a right aperture of the eyeframe.

System for stereoscopic visualization enabling depth perception of a surgical field

Interpupillary calibration system and method for stereoscopic visualization. The system includes a first display, second display, and calibration processor. The first display is disposed in proximity to a left aperture of an eyeframe to present a first image area through the left aperture, the first image area associated with an image and having a first display axis. The second display is disposed in proximity to a right aperture of the eyeframe to present a second image area through the right aperture, the second image area associated with the image and having a second display axis. The calibration processor is configured to adjust a display distance between the first image area and second image area based on an interpupillary distance of a user, wherein the first image area and second image area are visible through the first aperture and second aperture enabling formation of a stereoscopic view of the image.

Interpupillary calibration system, apparatus, and method for stereoscopic visualization

An adaptor associated with a stereoscopic field of view through a port. The adaptor includes a housing, frame, and cables. The housing includes circuits associated with imaging data. The frame is connected to the housing, and has a guide and aperture. The guide extends away from the frame and is configured to pass through an opening of the port. The guide includes a terminal end configured to extend into the port such that the aperture is in communication with the opening. The cables include sensors that receive the imaging data capable of producing the stereoscopic field of view. The sensors are disposed at a distance from one another at the terminal end of the guide, wherein the distance enables the sensors to receive the image data capable of producing the stereoscopic field of view. The cables extend from the sensors of the guide to respective integrated circuits in the housing.

Electronic adaptor for stereoscopic field of view through a port

Cans, bottles and/or other containers used to hold a carbonated beverage can include internal features to promote and/or control bubble formation.

Control of bubble size in a carbonated liquid

Provided herein are polymer (e.g., PET) compositions comprising exfoliated hexagonal boron nitride (h-BN), methods of preparing and methods of using thereof. The methods for preparing the polymer (e.g., PET) compositions include providing a reactant mixture comprising exfoliated hexagonal boron nitride (h-BN) and a first monomeric or oligomeric reactant, and polymerizing the first monomeric or oligomeric reactant. Also provided are containers (e.g., bottles) prepared using the polymer (e.g., PET) compositions comprising exfoliated h-BN.

Process for providing polymers comprising hexagonal boron nitride

Inflatable word novelty item

A thermoplastic article includes one or more recyclable-friendly synthetic coloring pigments. The pigment has a melting temperature that is about 20 to about 50&#xb0; C. higher than that of the base polymer. This enables the pigment to remain predominately intact (e.g., unmelted) during injection molding and act as a colorant in the preform and resulting blow molded container. When the container is remelted during subsequent processing, such as post-consumer recycling, the pigment melts and transesterifies into the base polymer. Thus, upon such further processing, the pigment effectively is subsumed into the base polymer and does not affect the basic characteristics and properties of the base polymer.

Recyclable colorants in plastic beverage containers

Method of manufacturing a structure which includes the steps of providing a structure having an insulator layer with at least one interconnect, forming a sub lithographic template mask over the insulator layer, and selectively etching the insulator layer through the sub lithographic template mask to form sub lithographic features spanning to a sidewall of the plurality of interconnects.

Device and methodology for reducing effective dielectric constant in semiconductor devices

Method of manufacturing a semiconductor device structure, including the steps of providing a structure having an insulator layer with at least one interconnect, forming a sub lithographic template mask over the insulator layer, and selectively etching the insulator layer through the sub lithographic template mask to form sub lithographic features spanning to a sidewall of the at least one interconnect.

Reducing effective dielectric constant in semiconductor devices

Method of manufacturing a structure which includes the steps of providing a structure having an insulator layer with at least one interconnect, forming a sub lithographic template mask over the insulator layer, and selectively etching the insulator layer through the sub lithographic template mask to form sub lithographic features spanning to a sidewall of the at least one interconnect.

Semiconductor structure includes an insulator layer having at least one interconnect feature and at least one gap formed in the insulator layer spanning more than a minimum spacing of interconnects.

Methods and structures having pore-closing layers for closing exposed pores in a patterned porous low-k dielectric layer, and optionally a reactive liner on the low-k dielectric. A first reactant is absorbed or retained in exposed pores in the patterned dielectric layer and then a second reactant is introduced into openings such that it enters the exposed-pores, while first reactant molecules are simultaneously being outgassed. The second reactant reacts in-situ with the outgassed first reactant molecules at a mouth region of the exposed pores to form the pore-closing layer across the mouth region of exposed pores, while retaining a portion of each pore's porosity to maintain characteristics and properties of the porous low-k dielectric layer. Optionally, the first reactant may be adsorbed onto the low-k dielectric such that upon introduction of the second reactant Into the patterned dielectric openings, a reactive liner is also formed on the low-k dielectric.

Exposed pore sealing post patterning

A method of forming an interconnect structure in an inter-layer dielectric (ILD) material, the method include the steps of creating one or more via openings in the ILD material; forming a first liner covering at least one of the one or more via openings; creating one or more trench openings on top of at least one of the one or more via openings covered by the first liner; and forming a second liner covering the trenching openings and at least part of the first liner. An interconnect structure formed by the method is also provided.

Interconnect structure and process of making the same

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Katonah, NY, United States of America

Lee Matthew Nicholson