Tango Systems, Inc.

Other

Lee LaBlanc

Ravi Mullapudi

Srikanth Dasaradhi

Michael S Barnes

Daniel John Hoffman

Steven C Shannon

Suresh Palanisamy

Harshal T Vasa

Harish Varma Penmethsa

Venkata Dora Chowdary Kakarla

A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.

Physical vapor deposition method using backside gas cooling of workpieces

Physical vapor deposition system using rotating pallet with X and Y positioning

A method and apparatus for routing harmonic energy within a plasma to ground in a plasma enhanced semiconductor wafer processing reactor. A model of the chamber is used to determine the pathway for RF power and the harmonic energy of that RF power through the chamber. From this model, the placement and design of a harmonic routing circuit is determined to shunt the harmonic energy to ground.

Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber

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Sunnyvale, CA, United States of America

Lee LaBlanc