H.c. Starck Gmbh

Leah F. Simkins

Leonid Natan Shekhter

Hugh P. Greville

Leonid Lanin

Leah F Simkins

Leonid L Lanin

Edward V McCormick

Anastasia M Conlon

Hugh P Greville

Edward K Schiele

Leonid Natan Shekter

A method of preparing primary refractory metals (e.g., primary tantalum metal) by contacting a particulate refractory metal oxide (e.g., tantalum pentoxide) with a heated gas (e.g., a plasma), is described. The heated gas comprises hydrogen gas. The temperature range of the heated gas and the mass ratio of hydrogen gas to refractory metal oxide are each selected such that: (i) the heated gas comprises atomic hydrogen; (ii) the refractory metal oxide feed material is substantially thermodynamically stabilized (i.e., the concurrent formation of suboxides that are not reduced by atomic hydrogen is minimized); and (iii) the refractory metal oxide is reduced by contact with the heated gas, thereby forming primary refractory metal (e.g., primary tantalum metal and/or primary niobium metal).

Method of preparing primary refractory metal

A method of producing a refractory metal powder by (A) combining (i) an oxide particle component and (ii) a reducing agent; (B) forming a substantially uniform mixture of (i) and (ii); (C) continuously feeding the mixture into a furnace; (D) igniting the mixture at a reaction zone and starting a reaction that is sufficiently exothermic to form a high temperature flash; (E) starting a reaction that is sufficiently exothermic to form a high temperature self-sustaining flash; and (F) producing a free-flowing reduced oxide powder.

Metalothermic reduction of refractory metal oxides

The allows: Ta&mdash;Si, Nb&mdash;Si, TaN&mdash;Si, NbN&mdash;Si and variants are used as enhanced powder anode substrates for electrolytic capacitor anodes (sintered powder masses) with dielectric oxide formation at walls of the internal pores.

Tantalum-silicon and niobium-silicon substrates for capacitor anodes

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Arlington, MA, United States of America

Leah F Simkins