Yangtze Memory Technologies Co., Ltd.

Le Wang

Wei Zhang

Jun Zhang

Yi Zhou

Yuanxiang Zou

In certain aspects, a method for training a model is disclosed. A model for measuring a geometric attribute of a hole structure in a semiconductor chip is provided by at least one processor. A plurality of training samples each including a pair of an optical spectrum signal and a reference signal corresponding to a same hole structure are obtained by the at least one processor. The reference signal is labeled with a labeled geometric attribute of the hole structure. An estimated geometric attribute of the hole structure is estimated using the model. A parameter of the model is adjusted based, at least in part, on a difference between the labeled geometric attribute and the estimated geometric attribute in each of the training samples by the at least one processor.

Systems and methods for semiconductor chip hole geometry metrology

Embodiments of systems and methods for measuring a geometric attribute of a hole structure in a semiconductor chip are disclosed. In an example, an optical spectrum signal corresponding to the hole structure in the semiconductor chip is received. The optical spectrum signal is characterized by one or more optical features. The geometric attribute of the hole structure is determined based, at least in part, on the optical features using a model. The model is trained from a plurality of training samples each including a pair of an optical spectrum signal and a labeled reference signal both corresponding to a same hole structure.

Growing community of inventors

Wuhan, China

Le Wang