Fei Comapny

Carl Zeiss Nts Gmbh

Carl Zeiss Microscopy Gmbh

Lawrence Scipioni

Noel S Smith

Roderick W Boswell

Orson Sutherland

John Keller

Christine Charles

Raymond Hill

Colin Sanford

Mark D DiManna

Michael Tanguay

Rainer K Knippelmeyer

John Anthony Notte, Iv

Christoph Riedesel

Lewis A Stern

John Morgan

Steve Berger

Billy W Ward

Louis S Farkas, Iii

Gregory A Schwind

Gerald G Magera

Ulrich Mantz

Ulrich Wagemann

Mohan Ananth

Bill DiNatale

William DiNatale

Nicholas Economou

The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.

Plasma source for a focused ion beam system

Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and (c) forming an image of the sample based on particles that leave the surface.

Reducing particle implantation

Magnetically enhanced, inductively coupled plasma source for a focused ion beam system

The disclosure relates to ion beams systems, such as gas field ion microscopes, having multiple modes of operation, as well as related methods. In some embodiments, the disclosure provides a method of operating a gas field ion microscope system that includes a gas field ion source, where the gas field ion source includes a tip including a plurality of atoms.

Gas field ion microscopes having multiple operation modes

A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.

Dual beam system

A first instrument () is used to image a first semiconductor article having a trench () of defined cross-section, while a second instrument () is used to simultaneously prepare a second semiconductor article with a trench of defined cross-section. Furthermore, a method is disclosed to prepare a trench () of defined cross-section in a semiconductor article by rough milling and subsequent fine milling.

Cross-section systems and methods

Methods and systems for defect repair are disclosed. The methods include: (a) identifying a defect causing an absence of an electrical connection between a first circuit element and a second circuit element, the first and second circuit elements being positioned in or on a substrate and the defect being positioned in the substrate; (b) removing a portion of the substrate to expose the defect, and depositing a conductive material to electrically connect the first and second circuit elements; and (c) verifying that the defect caused the absence of an electrical connection between the first and second circuit elements.

Repairing defects

Disclosed herein are methods that include: (a) exposing a sample in a chamber to a first gas, where the first gas reacts with surface contaminants on the sample to form a second gas; (b) removing at least a portion of the second gas from the chamber; and (c) exposing the sample to a charged particle beam to cause a plurality of particles to leave the sample and detecting at least some of the plurality of particles. The charged particle beam can include particles having a molecular weight of 40 atomic mass units or less.

Sample decontamination

A method of batch fabrication using established photolithographic techniques allowing nanoparticles or nanodevices to be fabricated and mounted into a macroscopic device in a repeatable, reliable manner suitable for large-scale mass production. Nanoparticles can be grown on macroscopic 'modules' which can be easily manipulated and shaped to fit standard mounts in various devices.

Method of fabricating nanodevices

Growing community of inventors

Bedford, MA, United States of America

Lawrence Scipioni