Promerus, Lcc

Tokyo Ohka Kogyo Co., Ltd.

Lawrence D Seger

Larry Funderburk Rhodes

Pramod Kandanarachchi

Kotaro Endo

Keita Ishiduka

Xiaoming Wu

Tomoyuki Ando

Chun S Chang

Brian L Goodall

Robert John Duff

Lester H McIntosh, Iii

Keita Tokyo Ohka Kogyo Co Ltd Ishiduka

Kotaro Tokyo Ohka Kogyo Co Ltd Endo

Tomoyuki Tokyo Ohka Kogyo Co Ltd Ando

Kotaro Tokyo Ohka Kogyo Coltd Endo

Embodiments of the present invention relate generally to non-self imagable and imagable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.

Norbornene-type polymers, compositions thereof and lithographic processes using such compositions

Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.

Norbornene-type polymers, compositions thereof and lithographic process using such compositions

Oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making such oligomers that includes reacting polycyclic olefin monomers in the presence of a Ni or Pd containing catalyst, or in the case of allylic monomers in the presence of a free radical initiator. The oligomers can be included in photoresist compositions as dissolution rate modifiers. The photoresist compositions can further include a polymeric binder resin, a photoacid generator, and solvents.

Dissolution rate modifiers for photoresist compositions

The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.

Norbornene-type monomers and polymers containing pendent lactone or sultone groups

The disclosed invention relates to novel norbornene-type monomers containing pendent lactone or sultone groups. The invention also relates to norbornene-type polymers and copolymers comprising one or more repeating units represented by the formula: and containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.

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Gates Mills, OH, United States of America

Lawrence D Seger