Applied Materials Israel Limited

Lavy Shavit

Yoram Uziel

Igor Krivts (Krayvitz)

Guy Eytan

Israel Avneri

Natan Schlimoff

Jacob Levin

Itay Asulin

Ofer Yuli

Yuri Belenky

Samuel Ives Nackash

Itzak Yair

Rafi Kraus

A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.

Charged particle beam source and a method for assembling a charged particle beam source

A semiconductor wafer is received at a first chamber that is at a first pressure level. The semiconductor wafer is at a first temperature and is heated, by a first heating module, to a second temperature while the pressure level of the first chamber is reduced from the first pressure level to a second pressure level. The semiconductor wafer is then provided to a supporting element of a second chamber which maintains a third pressure level that is closer to the second pressure level than to the first pressure level; the supporting element being at a third temperature that is closer to the second temperature than to the first temperature.

System and method for temperature control of a semiconductor wafer

Growing community of inventors

Rehovot, Israel

Lavy Shavit