Applied Materials, Inc.

Lavinia Nistor

Wei W Wang

Anantha K Subramani

Ashish Goel

Srinivas Guggilla

Hanbing Wu

Embodiments of a method and apparatus for co-sputtering multiple target materials are provided herein. In some embodiments, a process chamber including a substrate support to support a substrate; a plurality of cathodes coupled to a carrier and having a corresponding plurality of targets to be sputtered onto the substrate; and a process shield coupled to the carrier and extending between adjacent pairs of the plurality of targets.

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Saint Martin le Vinoux, France

Lavinia Nistor