Dynaloy, LLC

Lauri Kirby Kirkpatrick

Kimberly Dona Pollard

Michael Tod Phenis

Raymond Chan

Diane Marie Scheele

Gene Goebel

Methods for using improved stripper solutions having dimethyl sulfoxide; a quaternary ammonium hydroxide; an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, with the amino and hydroxyl substituents being attached to two different carbon atoms; and a surfactant. Some formulation can additionally contain a secondary solvent. The stripper solutions are effective for removing photoresists from substrates, and typically have freezing points below about +15&#xb0; C. and high loading capacities.

Dynamic multipurpose composition for the removal of photoresists and method for its use

Improved stripper solutions for removing photoresists from substrates are provided that typically have freezing points below about +15&#xb0; C. and high loading capacities. The stripper solutions comprise dimethyl sulfoxide, a quaternary ammonium hydroxide, and an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to two different carbon atoms. Some formulation can additionally contain a secondary solvent. Methods for use of the stripping solutions are additionally provided.

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Pittsboro, IN, United States of America

Lauri Kirby Kirkpatrick