Oerlikon Trading Ag, Truebbach

Oerlikon Solar Ag, Trubbach

Oc Oerlikon Blazers Ag

Laurent Sansonnens

Mustapha Elyaakoubi

Jacques Schmitt

Michael Irzyk

Arthur Buechel

Werner Wieland

Christoph Ellert

A vacuum vessel and at least two electrodes define an internal process space. At least one power supply is connectable with the electrodes. A substrate holder holds a substrate to be treated in the internal process space. At least one of the electrodes has along a first cross section a concave profile and has along a second cross section a convex profile, the first cross section being parallel to the second cross section. Gas is provided to the space through a gas inlet. Power is provided to the electrodes and the substrate is treated.

Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates

A method for producing a disk shaped workpiece with a dielectric substrate includes treatment in a plasma process volume between two electrode faces bounding a high-frequency plasma discharge. One electrode face is of dielectric material and is at a high-frequency potential with a varying distribution along the face. The other electrode face is metallic. Reactive gas is introduced into the process volume through an aperture pattern. The dielectric substrate, before treatment, is at least regionally coated with a layer material to whose specific resistanceapplies: 10&#x3a9;cm&#x2266;&#x2266;10&#x3a9;cm, and to the resulting surface resistance Rof the layer applies: 0&#x3c;R&#x2266;10&#x3a9;. Subsequently, the coated substrate is positioned on the metallic electrode face and is etched or coated reactively under plasma enhancement in the plasma process volume.

Method for manufacturing a plate-shaped workpiece

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Concise, Switzerland

Laurent Sansonnens