Centre National De La Recherche Scientifique

Rhodia Operations

Universitè Laval

Ecole Normale Superieure De Lyon

Laurent Bonneviot

Laurent Garel

Belen Albela

Thibaut Corre

Wenjuan Zhou

Ermanno Borra

Zhaoyu Fan

Xiaoshuang Feng

Floryan Decampo

Jean-Marc Clacens

Guillaume Malcouronne

The present invention relates to a process for hydroxylation of a compound of formula (I) by reacting the compound of formula (I) with an oxidizing agent, in the presence of a titanium silicalite zeolite prepared by crystallization preceded by a maturing step. The present invention also relates to a titanium silicalite zeolite and to the process for preparing same.

Process for hydroxylation of aromatic compounds, hydroxylation catalyst and process for preparing same

The present invention concerns a process to carry out an ester hydrolysis wherein the ester compound (c) is made from at least an alcohol (a) and a carboxylic acid (b), and wherein said alcohol (a) and said carboxylic acid (b) are forming a biphasic liquid system when mixed together; comprising at least a step of producing an ester compound (c)/water emulsion by using as stabilizing species amphiphilic solid particles of nanometric dimension and optionally a catalyst X.

Hydrolysis of an ester compound

The invention relates to a method of treating a liquid gallium or gallium alloy surface for prolonged use as a liquid mirror. The method of the invention comprises the steps of (a) contacting the surface of liquid gallium or gallium alloy with an aqueous solution of a halogenic acid to cause dissolution of any gallium oxide present on the surface, thereby obtaining an oxide-free liquid gallium or gallium alloy surface covered with a layer of the acid solution; (b) adding to the acid solution an aqueous solution of a surfactant present in an amount to form a single bimolecular layer of surfactant at an interface between the liquid gallium or gallium alloy and water; and (c) allowing a uniform passivating oxide layer to gradually form on the oxide-free liquid gallium or gallium alloy surface, the passivating oxide layer having surface irregularities smaller than 40 nm.

Surface chemical treatment for liquid gallium or gallium alloy mirrors

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Lyons, France

Laurent Bonneviot