Commissariat a L'energie Atomique Et Aux Energies Alternatives

Centre National De La Recherche Scientifique

Commissariat a L'energie Atomique

Electricite De France

Laurent Bedel

Guilhem Roux

Francis Maury

Denis Camel

Etienne Quesnel

Albin Chaise

Cédric Ducros

Frédéric Sanchette

Fabrice Emieux

Sophie Mailley

Michel Jouve

Cyril Cayron

Pierre-Alexandre Setier

Alain Bengaouer

Anthony Taupeau

Hary Demey Cedeno

Serge Ravel

Isabelle Champon

Sébastien Gros

Jacques Guillaudeau

Frédéric Ducros

A device for treating gases using surface plasma, including: at least one dielectric substrate having two opposite main surfaces, at least one first electrode, and at least one second electrode being respectively deposited on the two opposite main surfaces of the substrate, the first and second electrodes being connected to the two terminals of an electric power supply source; at least one catalytic support independent from the dielectric substrate and from the electrodes, and integrating a catalyst.

Device for treating gases using surface plasma

A method for diffusing metal particles including a composite layer deposited on a substrate, with the composite layer further including at least one dielectric matrix, and where the diffusion of the metal particles towards the substrate is achieved by means of a plasma treatment.

Method for diffusing metal particles within a composite layer

The sulfidation resistance of a silver-base material coating is further improved by making a concentration gradient of silver, oxygen and of one or more oxidizable alloying elements that may be present in the material, from the free surface of the coating up to a depth comprised between 10 nm and 1 &#x3bc;m and more particularly between 100 nm and 1 &#x3bc;m. Thus, the coating comprises a stack of one main layer made from silver-base material and of one oxidized thin film. The thin film, with a thickness comprised between 10 nm and 1 &#x3bc;m, thus presents a decreasing silver concentration gradient from the interface between the thin film and the main layer to the free surface of the thin film. Deposition of the coating on a support can be achieved by two successive physical vapor deposition steps, and more particularly by magnetron cathode sputtering.

Sulfidation-resistant silver-base coating, method for depositing such a coating and use thereof

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Quaix en Chartreuse, France

Laurent Bedel