Other

Mentor Graphics Corporation

Hewlett-packard Company

Laurence W Grodd

Kyohei Sakajiri

Fedor G Pikus

Patrick D Gibson

Nicolas Bailey Cobb

Emile Y Sahouria

George P Lippincott

John G Ferguson

Thomas H Kauth

Kurt C Hertz

William C Wickes

Leigh C Anderson

Charles M Patton

John W Stedman

David A Abercrombie

Jimmy Jason Tomblin

Siqiong You

Eugene Anikin

Robert A Todd

Sanjay Dhar

Robert M Miller

Paul J Mcclellan

Gabe L Eisenstein

Joseph D Sawicki

Zeki Bozkus

A computing system may include an electronic design automation (EDA) data constructor engine and an EDA executor engine. The EDA data constructor engine may be configured to perform, using the local resources of the computing system, a data preparation phase of an EDA procedure for a circuit design. The EDA executor engine may be configured to acquire remote resources for an execution phase of the EDA procedure, wherein the remote resources include remote compute resources and remote data resources remote to the computing system; broadcast constructor data constructed from the data preparation phase of the EDA procedure to the acquired remote data resources; and manage performance of the execution phase of the EDA procedure by the acquired remote compute resources and remote data resources.

Hybrid performance of electronic design automation (EDA) procedures with delayed acquisition of remote resources

Techniques are disclosed for optimizing the pattern density in the circuit layout design of a circuit layer. A layer in circuit design is analyzed to define empty regions that can be filled with fill polygons (referred to hereafter as 'fill' regions). Next, a pattern of fill polygons is generated. After the fill polygons have been defined, the layout design for the layer is divided into separate areas or 'windows,' and a target density for each window is determined. Once this target density for the window has been determined, the fill polygons required to most closely approach this target density are generated and added to the circuit layout design. This process may be repeated with progressively different (e.g., smaller) fill polygons, until each window meets or exceeds both the specified minimum density and complies with the specified maximum density gradient. Additionally, some implementations may allow a user to simultaneously optimize the density of multiple layers of a circuit by adding fill polygons to multiple layers of a circuit design simultaneously. Representations of sections of a multilayer fill structure will then be added to corresponding layers the circuit design until a specified target density is met.

Simultaneous multi-layer fill generation

Disclosed are representative embodiments of methods, apparatus, and systems for voltage-related analysis of layout design data. According to embodiments of the disclosed technology, voltage association data objects are generated for drawn layers in a net of a layout design and voltage values or ranges of voltage values associated with the net are collected. The voltage values or ranges of voltage values are then associated with the voltage association data objects. A voltage-related analysis may be performed by searching the voltage association data objects according to a predetermined criterion.

Voltage-related analysis of layout design data

A method of calculating electrical interactions of circuit elements in an integrated circuit layout without flattening the entire database that describes the layout. In one embodiment, a hierarchical database is analyzed and resistance and capacitance calculations made for a repeating pattern of elements are re-used at each instance of the repeated pattern and adjusted for local conditions. In another embodiment, a circuit layout is converted into a number of tiles, wherein the resistance and capacitance calculations made for the circuit elements in the center and a boundary region of the tiles are computed separately and combined. Environmental information that affects electrical interaction between circuit elements in different levels of hierarchy is calculated at a lower level of hierarchy so that such calculations do not need to be made for each placement of a repeated cell and so that not all interacting elements need to be promoted to the same hierarchy level to compute the electrical interactions.

Hierarchical feature extraction for electrical interaction calculations

Techniques are disclosed for modifying an existing microdevice design to improve its manufacturability. With these techniques, a designer receives manufacturing criteria associated with data in a design. The associated design data then is identified and provided to the microdevice designer, who may choose to modify the design based upon the manufacturing criteria. In this manner, the designer can directly incorporate manufacturing criteria from the foundry in the original design of the microdevice.

Manufacturability

Described herein are methods and systems for secure exchange of information related to electronic design automation. Information deemed sensitive and otherwise worthy of protection may be secured by methods such as encryption, obfuscation and other security measures. The secured information may be provided to an electronic design automation tool for processing without revealing at least some of the secured information. For instance, rule files related to integrated circuit manufacturability may be selectively annotated to indicate portions thereof deserving of protection. An encryption tool may be used to secure the information so indicated and generate a file comprising secured information related to electronic design automation. An electronic design automation tool may then unlock and use the secured information without revealing the same. For instance, the tool may be a physical verification tool capable of verifying whether any of the one or more integrated circuit layouts may violate one or more of the secured rules. An error report may be generated without revealing the secured rules.

Secure exchange of information in electronic design automation

Hierarchical feature extraction for electrical interaction

Information related to electronic design automation may be exchanged in a secure manner. Information deemed sensitive and otherwise worthy of protection may be secured by methods such as encryption, obfuscation and other security measures. The secured information may be processed without revealing at least some of the secured information. For instance, rule files related to integrated circuit manufacturability may be selectively annotated to indicate portions thereof deserving of protection. An encryption tool may be used to secure the information related to electronic design automation. An electronic design automation tool may then unlock and use the secured information without revealing the same. In one aspect, such access or secure use of the information may depend on one or more conditions being met (e.g., a time period or a number of uses or accesses). For instance, the tool may be a physical verification tool capable of verifying whether any of the one or more integrated circuit layouts may violate one or more of the secured rules.

A tool for optimizing the layout of a microdevice adds fragmentation points to polygons in a first hierarchical database layer in a manner suitable for application of a tool to apply a resolution enhancement technique (RET) such as optical and process correction (OPC). Portions of polygons in a database level that interact with polygons of a second level in the database are promoted to the second database level, and refragmented. The RET operates on the polygons of the first and second levels of the database to determine how polygons of each of the first and second levels should be adjusted, if necessary, such that the layout is optimized.

Selective promotion for resolution enhancement techniques

The invention discloses a method and apparatus for modifying, as appropriate, the geometries of a polygon. Based on various attributes associated with the polygon and its surroundings, modification of the location of the edge segments may conditionally occur. Additionally, if these modifications occur, a method to minimize the introduction of short edges during the modification is provided.

Short edge management in rule based OPC

Growing community of inventors

Portland, OR, United States of America

Laurence W Grodd