Inpria Corporation

Lauren B McQuade

Jeremy T Anderson

Stephen T Meyers

Kai Jiang

Brian J Cardineau

Benjamin L Clark

Dominick Smiddy

Margaret Wilson-Moses

Michael K Kocsis

Amrit K Narasimhan

Developer compositions are described based on blends of solvents, in which the developers are particularly effective for EUV patterning using organometallic based patterning compositions. Methods for use of these developing compositions are described. The blends of solvents can be selected based on Hansen solubility parameters. Generally, one solvent has low polarity as express by the sum of δP+δH, and a second solvent component of the developer has a higher value of δP+δH. Corresponding solvent compositions are described.

Organometallic photoresist developer compositions and processing methods

Precursor solutions for radiation patternable coatings are formed with an organic solvent and monoalkyl tin trialkoxides in which the water content of the solvent is adjusted to be within 10 percent of a selected value. Generally, the water content of the solvent is adjusted through water addition, although water removal can also be used. In some embodiments, the adjusted water content of the solvent can be from about 250 ppm by weight to about 10,000 ppm by weight. With the appropriate selection of ligands, the adjusted precursor solutions can be stable for at least about 42 days, and in some cases at least 8 months.

Stable solutions of monoalkyl tin alkoxides and their hydrolysis and condensation products

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Albany, OR, United States of America

Lauren B McQuade