International Business Machines Corporation

Globalfoundries Inc.

Laura S Chadwick

Anthony D Polson

James A Culp

Theodoros Anemikos

David James Hathaway

Donald Lawrence Wheater

Susan K Lichtensteiger

Jeffrey H Dreibelbis

Erik A Nelson

Toshiharu Saitoh

Thomas E Obremski

William R Corbin

Dureseti Chidambarrao

Jeanne P Bickford

David E Lackey

Christopher V Baiocco

Jeanne P Spence Bickford

Haraprasad Nanjundappa

Basanth Jagannathan

Various embodiments include approaches for analyzing integrated circuit (IC) designs. In some cases, an approach includes: defining extraction parameters for the design of the IC for each of a set of failure modes; testing the design of the IC for a failure mode in the set of failure modes; identifying a defined extraction parameter from the design of the IC for at least one of the set of failure modes; correlating the identified defined extracted parameter and each of the at least one failure mode for the design of the IC; and creating a normalized parameter equation representing the correlation of the identified defined extraction parameter with the at least one failure mode for the design of the IC in numerical form.

Integrated circuit (IC) design analysis and feature extraction

Disclosed is a method of laying out individual cells of an integrated circuit design, based at least in part on the known polysilicon perimeter densities of those cells. That is, the method embodiments use the knowledge of polysilicon perimeter density for known cells to drive placement of those cells on a chip (i.e., to drive floor-planning). The method embodiments can be used to achieve approximately uniform across-chip polysilicon perimeter density and, thereby to limit performance parameter variations between functional devices that are attributable to variations in polysilicon perimeter density. Alternatively, the method embodiments can be used to selectively control variations in the average polysilicon perimeter density of different regions of a chip and, thereby to selectively control certain performance parameter variations between functional devices located in those different regions.

Method of laying out integrated circuit design based on known polysilicon perimeter densities of individual cells

A system and method is provided for optimizing semiconductor power by integration of physical design timing and product performance measurements. The method includes: establishing a timing run and identifying a sigma code for the timing run; establishing ring oscillator bins and respective code; identifying a required timing run for a second level assembly to satisfy a selected voltage bin; timing a product using the required timing run; testing a ring oscillator of the product using the timing to obtain physical design identification; recording the physical design identification and the sigma code for the timing run; and using the recorded physical design identification and the sigma code to set a voltage for the product to optimize power.

System and method to optimize semiconductor power by integration of physical design timing and product performance measurements

Disclosed are embodiments of forming an integrated circuit with a desired decoupling capacitance and with the uniform and targeted across-chip polysilicon perimeter density. The method includes laying out functional blocks to form the circuit according to the design and also laying out one or more decoupling capacitor blocks to achieve the desired decoupling capacitance. Then, local polysilicon perimeter densities of the blocks are determined and, as necessary, the decoupling capacitor blocks are reconfigured in order to adjust for differences in the local polysilicon perimeter densities. This reconfiguring is performed in a manner that essentially maintains the desired decoupling capacitance. Due to the across-chip polysilicon perimeter density uniformity, functional devices in different regions of the chip will exhibit limited performance parameter variations (e.g., limited threshold voltage variations). Also disclosed herein are embodiments of an integrated circuit structure formed according to the method embodiments and a design structure for the integrated circuit.

Integrated circuit with uniform polysilicon perimeter density, method and design structure

A method of optimizing power usage in an integrated circuit design analyzes multiple operating speed cut points that are expected to be produced by the integrated circuit design. The operating speed cut points are used to divide identically designed integrated circuit devices after manufacture into relatively slow integrated circuit devices and relatively fast integrated circuit devices. The method selects an initial operating speed cut point to minimize a maximum power consumption level of the relatively slow integrated circuit devices and the relatively fast identically designed integrated circuit devices. The method then manufactures the integrated circuit devices using the integrated circuit design and tests operating speeds and power consumption levels of the identically designed integrated circuit devices. Then, the method adjusts the initial operating speed cut point to a final operating speed cut point based on the testing, to minimize the maximum power consumption level of the relatively slow integrated circuit devices and the relatively fast integrated circuit devices.

Method of optimizing power usage of an integrated circuit design by tuning selective voltage binning cut point

IC chip design modeling using perimeter density to an electrical characteristic correlation is disclosed. In one embodiment, a method may include determining a perimeter density of conductive structure within each region of a plurality of regions of an integrated circuit (IC) chip design; correlating a measured electrical characteristic within a respective region of an IC chip that is based on the IC chip design to the perimeter density; and modeling the IC chip design based on the correlation.

IC chip design modeling using perimeter density to electrical characteristic correlation

A design structure for monitoring of the performance of semiconductor circuits, such as circuit delay, across a chip. The design structure may include a clock source and a plurality of process monitors. The design structure may be used to construct a 'schmoo plot' by varying a frequency of the clock source to determine the delay of process monitors at various locations across the chip.

Design structure for monitoring cross chip delay variation on a semiconductor device

A system for testing a DRAM includes DRAM blocks, the system further includes a processor based built-in self test system for generating a test data pattern, for each DRAM block, performing a write of the test data pattern into the DRAM block, performing a pause for a predetermined period of time, and performing a read of a resulting data pattern from the DRAM block. For each DRAM block, the performing the write of the test pattern into the DRAM block is performed before the performing the pause for the predetermined period of time, and the performing the read of the resulting data pattern from the DRAM block is performed after the performing the pause for the predetermined period of time, and at least a portion of the pause for the predetermined period of time of two or more the DRAM blocks overlap in time.

Method for testing embedded DRAM arrays

A method and system for testing an embedded DRAM that includes DRAM blocks. The method including: generating a test data pattern in a processor based BIST system, for each DRAM block, performing a write of the test data pattern into the DRAM block, performing a pause for a predetermined period of time, and performing a read of a resulting data pattern from the DRAM block; where for each DRAM block, the write of the test data pattern into the DRAM block is performed before the pause, and the read of the resulting data pattern from each DRAM block is performed after the pause; where at least a portion of the pause of two or more of the DRAM blocks overlap in time; and for each DRAM block comparing the test data pattern to the resulting data pattern.

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Essex Junction, VT, United States of America

Laura S Chadwick