Growing community of inventors

Gilbert, AZ, United States of America

Laura Ledenbach

Average Co-Inventor Count = 12.00

ph-index = 1

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 2

Laura LedenbachXiaobo Shi (4 patents)Laura LedenbachJohn Anthony Marsella (4 patents)Laura LedenbachHongjun Zhou (4 patents)Laura LedenbachJo-Ann Theresa Schwartz (4 patents)Laura LedenbachJames Allen Schlueter (4 patents)Laura LedenbachDaniel Hernandez Castillo, Ii (4 patents)Laura LedenbachJohn Edward Quincy Hughes (4 patents)Laura LedenbachJae Ouk Choo (4 patents)Laura LedenbachSaifi Usmani (4 patents)Laura LedenbachMartin Kamau Ngigi Mungai (4 patents)Laura LedenbachSteven Charles Winchester (2 patents)Laura LedenbachSteve Charles Winchester (2 patents)Laura LedenbachLaura Ledenbach (4 patents)Xiaobo ShiXiaobo Shi (46 patents)John Anthony MarsellaJohn Anthony Marsella (28 patents)Hongjun ZhouHongjun Zhou (26 patents)Jo-Ann Theresa SchwartzJo-Ann Theresa Schwartz (17 patents)James Allen SchlueterJames Allen Schlueter (16 patents)Daniel Hernandez Castillo, IiDaniel Hernandez Castillo, Ii (9 patents)John Edward Quincy HughesJohn Edward Quincy Hughes (8 patents)Jae Ouk ChooJae Ouk Choo (6 patents)Saifi UsmaniSaifi Usmani (4 patents)Martin Kamau Ngigi MungaiMartin Kamau Ngigi Mungai (4 patents)Steven Charles WinchesterSteven Charles Winchester (4 patents)Steve Charles WinchesterSteve Charles Winchester (2 patents)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Air Products and Chemicals, Inc. (3 from 3,192 patents)

2. Versum Materials US, LLC (1 from 203 patents)


4 patents:

1. 10011741 - Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof

2. 9305476 - Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof

3. 9062230 - Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof

4. 8859428 - Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof

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1/7/2026
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