Asml Netherlands B.v.

Laura Del Tin

Xuedong Liu

Xuerang Hu

Yang-Shan Huang

Marc Smits

Qingpo Xi

Christiaan Otten

Xinan Luo

Stijn Wilem Herman Karel Steenbrink

Diego Martinez Negrete Gasque

Peter-Paul Crans

German Aksenov

Pieter Lucas Brandt

Almut Johanna Stegemann

Christan Teunissen

Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focusing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.

Lens designs

Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

Replaceable module for a charged particle apparatus

Growing community of inventors

The Hague, Netherlands

Laura Del Tin