Dow Global Technolgoies LLC

Other

The Dow Chemical Company

Ddp Specialty Electronic Materials Us, LLC

Laura A Grier

Bindu Krishnan

Sudhakar Balijepalli

Dale J Aldrich

Gary Lee Jialanella

William Hoy Heath

Robert B Turner

Michael E Mills

Syed Zafar Mahdi

William Aaron Koonce

Dwight D Latham

Ralph D Priester, Jr

Daniel P Sophiea

Jorge Jimenez

Hector Antonio Perez

Woo-Sung Bae

Bedri Erdem

Larry W Mobley

Mikhail Y Gelfer

Kenneth W Skaggs

Paul L Neill

Matthias Schaefer

Adam C Colson

Bindushree Radhakrishnan

Gregory F Meyers

Paul D Ries

Caitlin E Young

Hector Perez

A polyurethane glass sealant is made by reacting a poly(1,2-butylene oxide) polymer with a chain extender and a polyisocyanate. The poly(1,2-butylene oxide) polymer may be used as a mixture with up to 50% by weight of other polyols, including castor oil. The sealant is especially useful as a secondary sealant for an insulated glass unit (IGU).

Polyurethane sealant based on poly(butylene oxide) polyols for glass sealing

The invention relates to isocyanate-free elastomer adhesives based on hybrid urethane-acrylate epoxies. The hybrid shows properties consistent for structural adhesives with excellent mechanical and thermal stability, and low read-through. The adhesives are suitable for use in industry, e.g., as adhesives for automotive applications.

Polyurethane-acrylate epoxy adhesive

An isocyanate terminated prepolymer has been discovered that has sufficiently low glass transition temperature (Tg), necessary rheological properties and mechanical properties that allows for the making of adhesive compositions useful for bonding substrates into larger structures (e.g., windows in vehicles and buildings) with minimal or no plasticizers. The polyether prepolymer comprises a polyisocyanate reaction product of a polyisocyanate having an isocyanate functionality of greater than 2 and a polyether monol having an average molecular weight (Mw) of 1000 to 2000 g/moles and said prepolymer having: (i) a weight molecular weight average (Mw) of about 2000 to about 30,000 g/mole, (ii) a free isocyanate content of 0.8% to 4% by weight of said prepolymer, and (iii) viscosity of 1000 to 50,000 centipoises.

Polyurethane prepolymers having little or no plasticizer and their use in vehicular glass adhesives

Embodiments of the invention provide for polyurethane-based sealants. The sealants include a reaction product of a reaction system which includes at least one isocyanate, and at least one polyester polyol. The polyester polyol includes a reaction product of a polyester reaction mixture which includes one or more hydrophobic monomers, one or more organic diacids or methyl esters thereof, and one or more diols.

Polyurethane based insulated glass sealant

Embodiments of the invention include insulated units and methods of producing the insulating units. The insulating units include a first surface, a structural seal disposed on at least portions of the first surface, and a second surface disposed on the structural seal. The structural seal includes the reaction product of at least one first isocyanate, at least one isocyanate reactive side, and at least one adhesion promoter including a reaction product of at least one secondary aminoalkoxy silane and at least one second isocyanate.

Provided is a method for manufacturing a fixed abrasive material suitable for use in CMP planarization pads from an aqueous polymer dispersion that also includes abrasive particles that involves frothing the polymer dispersion, applying the froth to a substrate, mold or carrier and curing the froth to form a fixed abrasive material having an open cell structure containing between about 5 and 85 wt % abrasive particles and a dry density of about 350 kg/mto 1200 kg/m.

Method of manufacturing a fixed abrasive material

Provided are materials and methods for the chemical mechanical planarization of material layers using a down force of less than about 2.5 psi while maintaining a material removal rate generally similar to that obtained using higher down forces while simultaneously improving the selectivity of the process with respect to a primary material formed over a barrier material. The materials and methods disclosed herein are suitable for use in meatallization operations during semiconductor device fabrication, in particular in processes in which the primary material is a softer metal such as copper and the barrier material is a harder material such as a metal nitride.

Materials and methods for low pressure chemical-mechanical planarization

Provided are materials and methods for the chemical mechanical planarization of material layers such as oxide or metal formed on semiconductor substrates during the manufacture of semiconductor devices using a fixed abrasive planarization pad having an open cell foam structure from which free abrasive particles are produced by conditioning and combined with a carrier liquid to form an in situ slurry on the polishing surface of the planarization pad that, in combination with relative motion between the semiconductor substrate and the planarization pad, tends to remove the material layer from the surface of the semiconductor substrate. Depending on the composition of the material layer, the rate of material removal from the semiconductor substrate may be controlled by manipulating the pH or the oxidizer content of the carrier liquid.

Materials and methods for chemical-mechanical planarization

Novel catalyst compositions comprising complexes of tin(IV) salts and amine compounds are used to prepare polyurethanes, polyureas, polycarbodiimides and polyisocyanurates. The complexes, which preferably employ primary amines, allow delay of gelation until they dissociate under certain reaction conditions. The complexes can be prepared neat or in situ in an active hydrogen containing formulation component. The complexes serve to delay gelation of the formulation because they can be prepared to be relatively stable to moisture and will predictably dissociate upon heating, either as a result of the exothermic nature of the reaction being catalyzed or with application of an external heat source. The catalyst compositions are particularly useful for preparation of carpet underlay and in other applications requiring significant delay prior to gelation.

Process for preparation of polyurethanes utilizing novel catalysts

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Brazoria, TX, United States of America

Laura A Grier