Asml Netherlands B.v.

Lars Christian Freisem

Simon Gijsbert Josephus Mathijssen

Stefan Michiel Witte

Kjeld Sijbrand Eduard Eikema

Gijsbert Simon Matthijs Jansen

A metrology apparatus () includes a higher harmonic generation (HHG) radiation source for generating () EUV radiation. Operation of the HHG source is monitored using a wavefront sensor () which comprises an aperture array () and an image sensor (). A grating () disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings () of each subset having a different direction of dispersion. The spectrally resolved wavefront information () is used in feedback control () to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.

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Amsterdam, Netherlands

Lars Christian Freisem