Schott Ag

Auer Lighting Gmbh

Lars Brandt

Lars Bewig

Thomas Kuepper

Thomas Küpper

Christoph Moelle

Harry Wagener

Thomas Niklos

Margareta Hamel

A method and apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in by a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.

Method and apparatus for plasma enhanced chemical vapor deposition

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Kreiensen, Germany

Lars Brandt