Schott Ag

Carl-Zeiss-Stiftung

Schott Glas

Auer Lighting Gmbh

Lars Bewig

Christoph Moelle

Thomas Küpper

Thomas Kuepper

Wolfram Maring

Stefan Bauer

Stefan Geisler

Frank Koppe

Marten Walther

Jochen Heinz

Hartmut Bauch

Christopher Moelle

Christian Henn

Lutz Klippe

Stephan Behle

Martin Heming

Burkhard Danielzik

Roland Hochhaus

Jürgen Dzick

Markus Kuhr

Juergen Dzick

Wolfgang Moehl

Detlef Wolff

Christoph Mölle

Thomas Niklos

Wolfgang M&ouml;hl

Lars Brandt

Thomas K{umlaut Over (u)}pper

Thomas K&uuml;pper

Torsten Holdmann

Ulrich Zierfas

Jochen; Heinz

In the case of CVD methods, comprising PECVD and PICVD methods, the aim of the invention is to improve the impurity-free and, as far as possible, temporally and quantitatively precise feeding of process gases for the targeted layer systems. To this end, the invention provides a coating system and a method for coating articles with alternating layers, in the case of which process gases are introduced in an alternating fashion into a gas mixing point and mixed with a further gas and led to the reaction chamber, in which the deposition is carried out by producing a plasma.

Coating system and method for coating, as well as coated articles

A method and apparatus for coating substrates by means of plasma enhanced vapor deposition are provided, in which at least part of the surroundings of the substrate surface of a substrate to be coated is evacuated and a process gas with a starting substance for the coating is admitted, wherein the coating is deposited by a plasma being ignited by radiating in electromagnetic energy in the surroundings of the substrate surface filled with the process gas. The electromagnetic energy is radiated in by a multiplicity of pulse sequences, preferably microwave or radiofrequency pulses, with a multiplicity of pulses spaced apart temporally by first intermissions, wherein the electromagnetic energy radiated in is turned off in the intermissions, and wherein the intermissions between the pulse sequences are at least a factor of 3, preferably at least a factor of 5, longer than the first intermissions between the pulses within a pulse sequence.

Method and apparatus for plasma enhanced chemical vapor deposition

The invention relates to layer systems having at least one layer comprising titanium aluminum oxide. The layer comprising titanium aluminum oxide may be either a functional layer&#x2014;with or without interruption by an intermediate layer which is optically inactive&#x2014;or a functional layer formed from a metal oxide which is interrupted by an intermediate layer comprising titanium aluminum oxide. The layer systems are structurally and thermally stable at operating temperatures of over 600&#xb0; C. The layer systems may either comprise only one functional layer or may be a multilayer system, preferably an alternating layer system composed of functional layers with high and low refractive indices.

Layer system

A method of producing substrates with functional layers which have high optical properties and/or a high surface smoothness, in particular a low turbidity and significantly lower roughness, is provided. The method includes a sputtering process for coating a substrate with at least one functional layer, the sputtering process being interrupted at least once by the application of an intermediate layer with a thickness of less than 20 nm.

Process for producing layers and layer systems, and coated substrate

A reactor for simultaneous coating of eyeglasses on both sides thereof. Two partial devices are provided, each with a microwave energy waveguide, a gas supply and an apparatus for evacuating the coating chamber where the first and second devices can be moved relative to each other to open and close the coating chamber. The coating chamber itself is removable from the device and includes two gas supply connections and two connections for evacuating the coating chamber as well as microwave windows for coupling in microwave energy.

Volume-optimized reactor for simultaneously coating eyeglasses on both sides

An apparatus for coating objects having a single microwave source, two or more coating chambers, and an impedance structure or a waveguide structure. The coating chambers are connected to the single microwave source. The impedance structure or waveguide structure divides the microwave energy in order to generate plasmas in the coating chambers.

Device for the coating of objects

A method for producing optical functional coatings comprising niobium, tantalum, titanium or aluminum by supplying a precursor gas of low vapor pressure in a CVD coating system. A precursor selected from the group consisting of Nb, Ta, Ti, and Al compounds having a vapor pressure is maintained within a first supply container at a first temperature Tand a first pressure p. Precursor vapor of the precursor is supplied from the first supply container to an intermediate storage device through a first gas line which fluidly communicates the first supply container and the intermediate storage device. A carrier gas or reaction gas is supplied to the first gas line such that a mixture of the precursor with the carrier gas or the reaction gas is provided. The mixture is maintained in the intermediate storage device at a constant second pressure plower than the first pressure pand at a second temperature Tlower than the first temperature T, and the mixture is supplied from the intermediate storage device through a second gas line.

Gas supply method in a CVD coating system for precursors with a low vapor pressure

The invention relates to a coated object in which coatings remain of a constant and unchanged high quality despite operating temperatures of more than 350&#xb0; C. This is achieved with interlayers which deliberately interrupt and thereby stabilize the morphology of the coating.

Coated object

In order to improve the energy balance of an HID lamp, the quartz burner, preferably the inside thereof, is coated with a UV reflecting layer system by alternatingly applying amorphous thin layers made at least of titanium oxide and silicon oxide having the respective general stoichiometry TiOand SiOby means of a plasma impulse chemical vapor deposition (PICVD) method at a high power density and increased substrate temperatures ranging from 100&#xb0; to 400&#xb0; C., using small growth rates ranging from 1 nm/sec to 100 nm/sec so as to form an interference layer system having a thickness of less than 1200 nm and a minimized UV-active defective spot rate ranging from 0.1 to 1 percent.

Method for coating the quartz burner of an HID lamp

The invention envisages a light-generating apparatus that provides effective cooling of the reflector, the apparatus comprising a reflector and a device for improving the dissipation of heat from the reflector.

Light-generating apparatus having a reflector

The invention relates to a process for producing an object which has optical layers. According to the invention such a process comprises the following process steps: To a substrate of plastic material several optical layers are applied; the optical layers are applied by means of a chemical plasma-impulse vaporization (PICVC).

Object which has optical layers

A process for producing an object which has optical layers comprising the steps of applying optical layers to a substrate of plastic material wherein the optical layers are applied by means of a chemical plasma-impulse vaporization process (PICVD).

The invention concerns a plasma CVD system (in particular a plasma pulse CVD system) with an array of microwave antennas. According to the invention, in order to improve the homogeneity of the layer, interference is prevented by controlling adjacent antennas in a chronologically offset manner. To that end, microcapsules are provided within the macrocapsules of the plasma pulse CVD process. Additionally, the uniformity of the layer deposition at the interfaces between adjacent modules can be optimized by radio-frequency excitation by means of suitable electrodes, magnetic fields or the configuration of the gas inlets. The surface coated in an operating cycle can thus be scaled as required.

Growing community of inventors

Bad Gandersheim, Germany

Lars Bewig