Ut-battelle, Inc.

Lockheed Martin Energy Research Corporation

Larry R Baylor

Clarence E Thomas

Edgar Voelkl

Michael Leon Simpson

Michael J Paulus

Douglas H Lowndes

John B Wilgen

John Whealton

John C Whitson

Ilia N Ivanov

Roger Allen Kisner

Gregory Richard Hanson

James Anthony Moore

James Castracane

Kofi Korsah

John B Caughman

David A Rasmussen

Michelle Simkulet

Philip D Rack

Lawrence Clow

An infrared imaging device and method for making infrared detector(s) having at least one anode, at least one cathode with a substrate electrically connected to a plurality of doped carbon nanostructures; and bias circuitry for applying an electric field between the anode and the cathode such that when infrared photons are absorbed by the nanostructures the emitted field current is modulated. The detectors can be doped with cesium to lower the work function.

Doped carbon nanostructure field emitter arrays for infrared imaging

Systems and method are described for addressable field emission array (AFEA) chips. A plurality of individually addressable cathodes are integrated with an electrostatic focusing stack and/or a plurality of detectors on the addressable field emission array. The systems and methods provide advantages including the avoidance of space-charge blow-up.

Individually addressable cathodes with integrated focusing stack or detectors

Systems and methods are described for addressable field emission array (AFEA) chips. A method of operating an addressable field-emission array, includes: generating a plurality of electron beams from a pluralitly of emitters that compose the addressable field-emission array; and focusing at least one of the plurality of electron beams with an on-chip electrostatic focusing stack. The systems and methods provide advantages including the avoidance of space-charge blow-up.

Electrostatically focused addressable field emission array chips (AFEA's) for high-speed massively parallel maskless digital E-beam direct write lithography and scanning electron microscopy

Systems and methods for direct-to-digital holography are described. An apparatus includes a laser; a beamsplitter optically coupled to the laser; a reference beam mirror optically coupled to the beamsplitter; an object optically coupled to the beamsplitter, a focusing lens optically coupled to both the reference beam mirror and the object; and a digital recorder optically coupled to the focusing lens. A reference beam is incident upon the reference beam mirror at a non-normal angle, and the reference beam and an object beam are focused by the focusing lens at a focal plane of the digital recorder to form an image. The systems and methods provide advantages in that computer assisted holographic measurements can be made.

Direct-to-digital holography and holovision

Virtual mask digital electron beam lithography

Growing community of inventors

Farragut, TN, United States of America

Larry R Baylor