Yangtze Memory Technologies Co., Ltd.

Lan Yao

Zhenyu Lu

Li Hong Xiao

Jun Chen

Jifeng Zhu

Xiaowang Dai

Qian Tao

Haohao Yang

Si Ping Hu

Kun Bao

A Man Zheng

Lei Xue

Yu Huang

Yushi Hu

Jin Wen Dong

Xiaoxin Liu

Jin Lyu

Chia-Chann Shiue

A semiconductor structure is disclosed. The semiconductor structure includes a staircase structure disposed over a substrate. The staircase structure includes a plurality of layer stacks, where each layer stack is made of a first material layer over a portion of a second material layer. The staircase structure further includes a plurality of landing pads, where each landing pad is disposed over another portion of the second material layer of a respective layer stack.

Staircase structure for memory device

Embodiments of a three-dimensional (3D) memory device and method for forming the 3D memory device are provided. In an example, the 3D memory device includes a plurality of conductor layers extending over a substrate, a channel structure vertically extending through the conductor layers to the substrate, and a source structure extending through the conductor layers to the substrate. The channel structure may include a blocking layer having a plurality of blocking portions disconnected from one another. Each of the blocking portions may include (i) a vertical blocking portion under a respective conductor layer, and (ii) at least one lateral blocking portion covering a respective lateral surface of the respective conductor layer. The channel structure may also include a memory layer having a plurality of memory portions disconnected from one another, each of the memory portions under and in contact with the respective vertical blocking portion.

Three-dimensional memory devices with improved charge confinement and fabrication methods thereof

A three-dimensional (3D) memory device and a manufacturing method thereof are provided. The method includes the following steps. An alternating dielectric stack is formed on a substrate. A vertical structure is formed penetrating the alternating dielectric stack in a vertical direction. A bottom dielectric layer of the alternating dielectric stack is removed. An epitaxial layer is formed between the substrate and the alternating dielectric stack after removing the bottom dielectric layer. An insulating layer is formed on the epitaxial layer. The insulating layer is located between the epitaxial layer and the alternating dielectric stack. The influence of the step of forming the vertical structure on the epitaxial layer may be avoided, and defects at the interface between the epitaxial layer and the bottom dielectric layer may be avoided accordingly.

Three-dimensional memory device and manufacturing method thereof

Embodiments of semiconductor structures including word line contact structures for three-dimensional memory devices and fabrication methods for forming word line contact structures are disclosed. The semiconductor structures include a staircase structure having a plurality of steps, and each step includes a conductive layer disposed over a dielectric layer. The semiconductor structures further include a barrier layer disposed over a portion of the conductive layer of each step. The semiconductor structures also include an etch-stop layer disposed on the barrier layer and an insulating layer disposed on the etch-stop layer. The semiconductor structures also include a plurality of conductive structures formed in the insulating layer and each conductive structure is formed on the conductive layer of each step.

Word line contact structure for three-dimensional memory devices and fabrication methods thereof

A three-dimensional (3D) memory device is provided. The 3D memory device includes a substrate, an alternating conductive/dielectric stack, an epitaxial layer, and a vertical structure. The alternating conductive/dielectric stack is disposed on the substrate. The alternating conductive/dielectric stack includes a plurality of dielectric layers and a plurality of conductive layers alternately stacked in a vertical direction perpendicular to a surface of the substrate. The epitaxial layer is disposed between the substrate and the alternating conductive/dielectric stack in the vertical direction. The vertical structure penetrates the alternating conductive/dielectric stack in the vertical direction for being partly disposed in the epitaxial layer. The epitaxial layer includes a protruding part disposed between the vertical structure and a bottom dielectric layer of the alternating conductive/dielectric stack in a horizontal direction orthogonal to the vertical direction.

Three-dimensional memory device

Embodiments of three-dimensional (3D) memory devices are disclosed. In an example, a 3D memory device includes a substrate, a peripheral device disposed on the substrate, a memory stack disposed above the peripheral device and including a plurality of conductor/dielectric layer pairs, and a plurality of memory strings. Each of the memory strings extends vertically through the memory stack and includes a drain select gate and a source select gate above the drain select gate. Edges of the conductor/dielectric layer pairs in a staircase structure of the memory stack along a vertical direction away from the substrate are staggered laterally toward the memory strings.

Three-dimensional memory devices

A method for forming a 3D memory device is disclosed. The method comprises: forming an alternating conductive/dielectric stack on a substrate; forming a slit vertically penetrating the alternating conductive/dielectric stack; forming an isolation layer on a sidewall of the slit; forming a first conductive layer covering the isolation layer; performing a plasma treatment followed by a first doping process to the first conductive layer; forming a second conductive layer covering the first conductive and filling the slit; performing a second doping process followed by a rapid thermal crystallization process to the second conductive layer; removing an upper portion of the first conductive layer and the second conductive layer to form a recess in the slit; and forming a third conductive layer in the recess.

Array common source structures of three-dimensional memory devices and fabricating methods thereof

A method for forming a channel hole structure of a 3D memory device is disclosed. The method includes: forming a first alternating dielectric stack and a first insulating layer on a substrate; forming a first channel structure in a first channel hole penetrating the first insulating layer and the first alternating dielectric stack; forming a sacrificial inter-deck plug in the first insulating layer; forming a second alternating dielectric stack on the sacrificial inter-deck plug; forming a second channel hole penetrating the second alternating dielectric stack and expose a portion of the sacrificial inter-deck plug; removing the sacrificial inter-deck plug to form a cavity; and forming an inter-deck channel plug in the cavity and a second channel structure in the second channel hole, the inter-deck channel plug contacts the first channel structure and the second channel structure.

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Hubei, China

Lan Yao