Asml Netherlands B.v.

Lambertus Gerardus Maria Kessels

Patricius Aloysius Jacobus Tinnemans

Martinus Hendricus Hendricus Hoeks

Arie Jeffrey Den Boef

Pieter Willem Herman De Jager

Kaustuve Bhattacharyya

Paul Christiaan Hinnen

Dominicus Jacobus Petrus Adrianus Franken

Willem Jurrianus Venema

Youri Johannes Laurentius Maria Van Dommelen

Peter David Engblom

Wouter Frans Willem Mulckhuyse

Theodorus Leonardus Van Den Akker

Marco Johannes Annemarie Pieters

Marcel Bontekoe

Remco Johannes Van Engelen

Marco Cornelis Jacobus Martinus Van Hassel

Andrej Makarovic

Arno Jan Bleeker

Kars Zeger Troost

Wilhelmus Josephus Box

Stoyan Nihtianov

Henricus Gerardus Tegenbosch

Martinus Cornelis Reijnen

Petrus Wilhelmus Josephus Maria Kemper

Kamen Hristov Chilov

Frank Anton Morselt

Tobrjörn Sandström

Arno Jano Bleeker

A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.

Inspection method, lithographic apparatus, mask and substrate

A system is provided that includes a device having an emissive portion, a memory, and a dictionary decompressor. The device having an emissive portion is configured to produce a patterned beam. The memory is configured to store a compressed representation of a requested dose pattern, comprising two groups of repeating pattern features, to be formed on a surface by the patterned beam. The dictionary decompressor at least partially decompresses the compressed representation. The dictionary decompressor comprises a first dictionary memory configured to store pattern data corresponding to a first group of the two groups of repeating pattern features and a second dictionary memory configured to store pattern data corresponding to a second group of the two groups of repeating pattern features. The repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. Related methods are also provided.

Lithographic apparatus and device manufacturing method utilizing a multiple dictionary compression method for FPD

A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method includes generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.

Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume

A lithographic apparatus comprises an array of individually controllable elements that modulate a beam of radiation, a compressed-pattern memory that stores a compressed representation of a requested dose pattern to be formed on a substrate by the modulated beam, and a dictionary decompressor that at least partially decompresses the compressed representation. The dictionary decompressor comprises an external dictionary memory, a first dictionary decoder that at least partially decompresses at least a part of the compressed representation by extracting, from the external dictionary memory, portions of pattern data corresponding to references to the external dictionary memory contained in the compressed representation, and a second dictionary decoder having an internal dictionary memory, the second dictionary decoder that at least partially decompresses at least a part of the compressed representation by extracting, from the internal dictionary memory, portions of pattern data corresponding to references to the internal dictionary memory contained in compressed representation.

A lithographic apparatus comprises an array of individually controllable elements and a data processing pipeline. The array of individually controllable elements modulates a beam of radiation. The data processing pipeline converts a first representation of a requested dose pattern to a sequence of control data suitable for controlling the array of individually controllable elements in order substantially to form the requested dose pattern on a substrate. The data processing pipeline comprises an offline pre-processing device and an online rasterizer. The offline pre-processing device converts the first representation of the requested dose pattern to an intermediate representation, which can be rasterized in a fewer number of operations than the first representation. The storage device stores the intermediate representation. The online rasterizer accesses the stored intermediate representation and produces therefrom a stream of bitmap data to be used to generate the sequence of control data substantially in real time.

Lithographic apparatus and device manufacturing method utilizing 2D run length encoding for image data compression

A lithographic apparatus provided with an array of individually controllable elements that is detachably mounted to mounting points on a support frame of the lithographic apparatus.

Lithographic apparatus and device manufacturing method

A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.

The present invention comprises a lithographic apparatus and device manufacturing method method that uses a patterning device that increase a number of individually controllable elements that are programmed simultaneously to increase an update rate of an array of individually controllable elements. A number of required high speed analog inputs to the array is reduced. The complexity of the array is reduced and the maximum update speed of the array is increased. Furthermore, the number of elements within an array can be readily expanded. The patterning device can be divided into a plurality of groups of cells and the lithographic apparatus can comprise a plurality of supply channels. Each supply channel can be arranged to provide a voltage signal to each cell in a respective group of cells. This can reduce the number of required inputs to the patterning device for individually addressing each cell.

Lithographic apparatus, device manufacturing method, device manufactured thereby, and controllable patterning device utilizing a spatial light modulator with distributed digital to analog conversion

A lithography apparatus including a projection system configured to project a beam of radiation as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation to form a requested dose pattern on a substrate. The requested dose pattern is built up over time from an array of localized exposures in which at least neighboring localized exposures are imaged at substantially different times and in which each localized exposure is produced by one of the sub-beams of radiation. The lithography apparatus also includes a rasterizer device arranged to convert data defining the requested dose pattern to a sequence of data representing the requested dose at a corresponding sequence of points within the pattern, and also a data manipulation device arranged to receive the sequence of data and constitute a control signal suitable for controlling the array of individually controllable elements.

A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.

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Aalst-Waalre, Netherlands

Lambertus Gerardus Maria Kessels