Asml Netherlands B.v.

Lambertus Dominicus Noordam

Hans Jansen

Richard Joseph Bruls

Ivo Adam Johannes Thomas

Marcio Alexandre Cano Miranda

Bauke Jansen

Gheorghe Tanasa

Siebe Landheer

Laurentius Catrinus Jorritsma

Jeroen Peter Johannes Bruijstens

Arnout Johannes Meester

Maurice Martinus Johannes Van Der Lee

A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Lithographic apparatus and a method of operating the apparatus

Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure

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Overveen, Netherlands

Lambertus Dominicus Noordam