Asml Netherlands B.v.

Lambertus Adrianus Van Den Wildenberg

Vadim Yevgenyevich Banine

Josephus Jacobus Smits

Vladimir Vitalevitch Ivanov

Carolus Ida Maria Antonius Spee

Alexander Matthijs Struycken

Klaas Timmer

Harm-Jan Voorma

Johannes Bernardus Ridder

Vladimir Mihailovitch Krivtsun

Nicolaas Rudolf Kemper

Engelbertus Antonius Fransiscus Van Der Pasch

Henrikus Herman Marie Cox

Dominicus Jacobus Petrus Adrianus Franken

Vladimir Mikhailovich Krivtsun

Arnoud Cornelis Wassink

Leonid Aizikovitch Sjmaenok

Paul Peter Anna Antonius Brom

Alexander Alexandrovitch Schmidt

Eric Louis Willem Verpalen

Antonius Johannes Van De Pas

Martijn Johannes Verbunt

A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

Ex-situ removal of deposition on an optical element

A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

Lithographic apparatus, contaminant trap, and device manufacturing method

A rotatable contamination barrier for use with an extreme ultraviolet radiation system includes a blade structure configured to trap contaminant material coming from a radiation source, and an eccentric mass element displaced relative to a central axis of rotation to balance the blade structure when the blade structure is rotated about the central axis.

Contamination barrier and lithographic apparatus

A rotatable contamination barrier for use with an EUV radiation system is disclosed. The contamination barrier has a blade structure configured to trap contaminant material coming from a radiation source, a bearing structure, coupled to a static frame, configured to rotatably bear the blade structure, and an eccentric mass element displaced relative to a central axis of rotation to balance the blade structure in the bearing structure.

Contamination barrier and lithographic apparatus comprising same

A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a fastener for fastening a first part of the apparatus to a second part of the apparatus. The fastener includes at least one integrated spring.

Lithographic apparatus, a device manufacturing method, and a fastener for use in a lithographic apparatus

In a projection system for EUV, the positions of mirrors are measured and controlled relative to each other, rather than to a reference frame. Relative position measurements may be made by interferometers or capacitive sensors mounted on rigid extensions of the mirrors.

Lithographic apparatus and device manufacturing method

Growing community of inventors

Geldrop, Netherlands

Lambertus Adrianus Van Den Wildenberg