Globalfoundries Singapore Pte. Ltd.

Lai Qiang Luo

Fan Zhang

Fangxin Deng

Zhiqiang Teo

Xin Shu Cai

Jin Qiu Liu

Eugene Kong

Device and method for forming a device are disclosed. The method includes providing a substrate prepared with a memory cell region having a pair of non-volatile memory cells with a split gate. A split gate includes first and second gates. The first gate is an access gate and the second gate is a storage gate with a control gate over a floating gate. A common second S/D region is disposed adjacent to second gates of the first and second memory cells and first S/D regions are disposed adjacent to the first gates of the first and second memory cells. An erase gate is disposed over the common second S/D region. The erase gate is isolated by the second S/D and second gates by dielectric layers. A silicide block is disposed over the memory cell pair, covering the erase gate at least portions of the second gates of the memory cells.

Growing community of inventors

Singapore, Singapore

Lai Qiang Luo