Hgst Netherlands, B.v.

Western Digital Technologies, Inc.

Hitachi Global Storage Technologies Netherlands B.v.

Western Digital (fremont), Inc.

Kyusik Shin

Yingjian Chen

Fenglin Liu

Qiping Zhong

Wen-Chien David Hsiao

Liubo Hong

Honglin Zhu

Shiwen Huang

Yi Zheng

Donald Giles Allen

Andrew Chiu

Katalin Pentek

Edward H P Lee

Aron Pentek

Edward Hin Pong Lee

Suping Song

Brian Rodrick York

Sue Siyang Zhang

Ning Shi

Amanda Baer

Yuming Zhou

Munhyoun Park

April D Hixson-Goldsmith

Mun Hyoun Park

Jennifer Leung

Embodiments of the present disclosure generally relate to data storage devices, and more specifically, to a magnetic media drive employing a write head. The write head comprises a main pole and a monolithic side shield. A first leading shield is disposed below the side shield, and a second leading shield is disposed between the first leading shield and the side shield. The first leading shield has a greater throat height than a throat height of the second leading shield. A side shield throat height extending from the main pole to the side shield is shorter than the first leading shield throat height extending from the main pole to the first leading shield. The varying throat heights between the main pole, the side shield, and the first leading shield allow for enhanced cross-track recording density and reduce flux leakage from the main pole.

Write head having a monolithic side sheild and leading shield

Ionized physical vapor deposition (IPVD) is used to form a magnetic recording disk drive write head main pole with thin side gap layers and a thicker leading gap layer. A metal or metal alloy is formed by IPVD in a trench with a bottom and outwardly sloping sidewalls. An optional Ru seed layer is deposited on the metal or metal alloy. This is followed by atomic layer deposition (ALD) of a Ru smoothing layer. If the IPVD results in metal or metal alloy side gap layers with a rough surface, the ALD process is modified, resulting in a smooth Ru smoothing layer that does not replicate the rough surface of the side gap layers.

Method for making a perpendicular magnetic recording write head with write pole having thin side gaps and thicker leading gap

The embodiments of the present invention generally relate to a method for forming a trench in which a write pole is deposited therein. The trench is formed with a single mask and multiple reactive ion etching (RIE) processes and has substantially straight side walls and a consistent bevel angle along the length of the write pole. The consistent bevel angle along the length of the write pole allows the bevel angle at the ABS to be consistent regardless of where the cut is when defining the ABS.

Method for forming a magnetic head for perpendicular magnetic recording

A perpendicular magnetic recording (PMR) head is disclosed. The PMR head includes a perpendicular magnetic recording pole having at least one side, a bottom and a top wider than the bottom. The PMR head also includes at least one side gap, at least one side shield, a to gap on the PMR pole and a top shield. The side gap(s) encapsulate the side(s) of the PMR pole, has at least one width and is between the PMR pole and the side shield(s). The to gap has a thickness such that the ratio of the width(s) to the thickness is greater than one. A portion of the top gap is between at least part of the top shield and the side shield(s).

Perpendicular magnetic recording write head having a wrap around shield

The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.

Method for manufacturing wraparound shield write head using hard masks

A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.

Magnetic write head manufactured by an enhanced damascene process producing a tapered write pole with a non-magnetic spacer and non-magnetic bump

A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.

Use of magnetic material for RIE stop layer during damascene main pole formation

A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.

Perpendicular write head with wrap around shield and conformal side gap

Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.

Process to make PMR writer with leading edge shield (LES) and leading edge taper (LET)

A method for manufacturing a magnetic write head having a leading magnetic shield and a trailing magnetic shield that are arranged to prevent the lost of magnetic write field to the trailing magnetic shield. The write head includes a non-magnetic step layer that provides additional spacing between the trailing magnetic shield and the write pole at a region removed from the air bearing surface.

Growing community of inventors

Pleasanton, CA, United States of America

Kyusik Shin