Samsung Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Kyungbo Shim

Giyong Nam

Daesung Lim

Sangtae Kim

Kitae Kim

Changsoo Kim

Jonghee Park

Jinseock Kim

Beomsoo Kim

Jinhyung Kim

Youngjin Yoon

Youngchul Park

Byungsu Lee

Jungseek Jung

Joohwan Chung

Dongki Kim

Jinsook Kim

Sanghoon Jang

Haccheol Kim

A thin film etchant composition for preventing re-adsorption of an etched metal and uniformly etching a thin film is provided. The thin film etchant composition includes about 43 wt % to about 46 wt % of phosphoric acid, about 5 wt % to about 8 wt % of nitric acid, about 10 wt % to about 17 wt % of acetic acid, about 1 wt % to about 3 wt % of iron nitrate, about 0.7 wt % to about 1.5 wt % of phosphate, and deionized water as a remaining amount based on a total weight of the thin film etchant composition.

Thin film etchant composition and method of forming metal pattern by using the same

An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.

Etchant and method of manufacturing display device by using the same

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Jeollabuk-do, South Korea

Kyungbo Shim